Outlier Substrate Inspection via Multi-Dimensional Feature Space

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Solution Overview

Problem

Conventional defect detection methods for integrated circuit substrates become less effective due to process variations and substrate noise, leading to severe color variation and grains in images, making it difficult to accurately identify defects.

Innovation Solution

A method that selects test features and reference features from images, creates a multi-dimensional signal distribution, identifies statistical outliers as anomalies, and uses a lookup table to locate defect positions, enhancing distinction and sensitivity through variable grouping algorithms and image modality compensation.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If conventional defect detection methods are used, then the inspection process is simple, but the detection precision deteriorates due to process variation and substrate noise causing severe color variation and grains in images

Engineering Contradiction:
Improvedefect detection precisionVSAvoidinspection system complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The patent transforms the defect detection problem from conventional 2D image space to a multi-dimensional feature space. Multiple features are extracted from image pixels and organized into feature vectors, creating an N-dimensional space where defects can be distinguished from normal variations. This dimensional transformation allows statistical methods to effectively separate defect signals from process variation noise, resolving the contradiction between detection precision and system complexity.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Solution Approach 2:

The patent changes the parameters used for defect detection from simple pixel intensity values to multiple extracted features including intensity, gradient, texture, and other characteristics. By transforming the detection parameters into a multi-dimensional feature space and applying statistical analysis, the system achieves higher detection precision while managing complexity through systematic feature selection and dimensionality reduction techniques.

Inventive Principle:
Principle #35Parameter changes

2Measurement precision

If individual pixel comparison is used, then the processing speed is fast, but the distinction between features is insufficient to identify real defects amidst noise

Engineering Contradiction:
Improvefeature distinction capabilityVSAvoidinspection processing speed
Core Design Contradiction:
Measurement precisionVSProductivity

Solution Approach 1:

The patent merges information from multiple pixels and multiple feature types into composite feature vectors. Instead of analyzing individual pixels in isolation, the method combines intensity, gradient, texture, and other features across multiple pixels to create comprehensive feature representations. This merging approach enhances feature distinction capability while maintaining processing efficiency through vectorized operations and statistical batch processing.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

By organizing pixel information into multi-dimensional feature vectors rather than scalar pixel values, the patent creates additional dimensions for distinguishing defects from noise. This dimensional expansion provides more discriminatory power for identifying real defects while enabling efficient processing through statistical methods that operate on the structured feature space.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

3Reliability

If statistical outlier methods are applied in multi-dimensional feature space, then the sensitivity and robustness of defect detection improve, but the computational complexity increases

Engineering Contradiction:
Improvedefect detection reliabilityVSAvoidcomputational complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent performs preliminary actions by pre-defining the multi-dimensional feature space structure, selecting relevant features, and establishing statistical baselines from reference data before actual defect detection. This preliminary setup includes determining feature extraction parameters, creating reference distributions, and configuring dimensionality reduction methods. By preparing these elements in advance, the system achieves high detection reliability while reducing real-time computational complexity during actual inspection operations.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent manages computational complexity by carefully selecting and transforming parameters into a optimized feature space. Through feature selection, extraction, and potential dimensionality reduction, the system identifies the most discriminative features while reducing the total number of dimensions. This parameter transformation maintains statistical outlier detection effectiveness while making the computational process more manageable and efficient.

Inventive Principle:
Principle #35Parameter changes

Data Source

PatentUS7440607B1Outlier substrate inspection
Publication Date: 2008.10.21 KLA TENCOR TECHNOLOGY CORP
  • US7440607B1 patent drawing
  • US7440607B1 patent drawing

AI summary

A method of detecting anomalies in a test image. Test features of pixels within the test image are selected, and reference features of pixels within at least one reference image are also selected. A signal distribution of test features and reference features in a multi-dimensional feature space is created, and stored. Those test features of the test image that do not satisfy a set of criteria for normalcy are selected as candidate points. Those candidate points that are statistical outliers are identified as anomalies. Positions of the anomalies are located using the stored signal distribution within which the defects have been identified as a lookup table.