Overlay Measurement Control for Remote Recipe Optimization
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Current overlay measurement systems require manual input of recipes and optimization of measurement options, which is time-consuming, prone to errors, and dependent on the technician's skills and experience.
Innovation Solution
A manager program driven by a user terminal that allows for remote control of measurement devices, optimizing measurement options based on received data, and transmitting optimized recipes to measurement devices for efficient wafer characterization.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If manual input of recipes and optimization of measurement options is performed, then measurement accuracy can be maintained, but time consumption and operational complexity increase
Solution Approach 1:
The system performs preliminary optimization of measurement options by automatically analyzing recipe parameters and determining optimal measurement conditions before actual wafer measurement, eliminating the need for manual trial-and-error optimization during operation
Solution Approach 2:
The measurement device automatically optimizes its own measurement options by analyzing recipe data and selecting optimal parameters independently, without requiring manual intervention or technician expertise
2Measurement precision
If manual optimization of measurement options is performed by technicians, then measurement quality can be ensured, but reliance on technician skills and experience creates inconsistency
Solution Approach 1:
The system implements automated feedback loops where measurement data is analyzed and used to automatically adjust and optimize measurement options, ensuring consistent quality without relying on variable human judgment
Solution Approach 2:
The patent replaces the manual mechanical process of technician-based optimization with an automated computational system that analyzes recipe parameters and determines optimal measurement conditions algorithmically
3Ease of operation
If direct input of recipes to measurement device is required, then measurement process can be controlled, but restrictions on time and space occur
Solution Approach 1:
The system introduces an automated recipe analysis and optimization module as an intermediary between the user and measurement device, which automatically processes recipe inputs and generates optimized measurement parameters without requiring direct manual configuration
4Measurement precision
If multiple options of filter, aperture, focus, pinhole are manually tested, then optimal measurement conditions can be found, but device complexity and operational difficulty increase
Solution Approach 1:
The system performs preliminary analysis of all measurement parameters (filter, aperture, focus, pinhole) based on recipe data before actual measurement, pre-determining optimal combinations without requiring manual testing during operation
Data Source
AI summary
An overlay measurement device for measuring an error between a first overlay mark and a second overlay mark respectively formed on different layers of a wafer, includes: a light source; an aperture that changes a beam from the light source to be suitable for photographing the first overlay mark or the second overlay mark; a detector for obtaining an image of the first overlay mark or an image of the second overlay mark; a transmission and receipt part; and a processor connecting to the transmission and receipt part electrically.