Overlay Metrology Scanning for Optical Aberration Control

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Solution Overview

Problem

Lithographic apparatuses suffer from optical aberrations that affect the quality of off-axis images in overlay systems, necessitating improved control of optical aberrations for better image quality and focus.

Innovation Solution

A system comprising an illumination system, scanning system, optical system, detector system, and processor is used to direct and control an optical beam onto a target structure, maintaining alignment with the optical axis during scanning, and analyzing the detected signal beam to determine overlay characteristics.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Device complexity

If optical aberrations are present in the overlay system, then the system can operate with simpler optical components, but the image quality and focus deteriorate

Engineering Contradiction:
Improveoptical system complexityVSAvoidoverlay measurement accuracy
Core Design Contradiction:
Device complexityVSMeasurement precision

Solution Approach 1:

The patent implements a feedback mechanism where the overlay system measures overlay characteristics and this information is fed back to control the optical aberrations. The processor analyzes the signal beam to determine overlay characteristics and uses this feedback to adjust the optical system, creating a closed-loop control system that maintains image quality while managing system complexity.

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The patent changes optical parameters dynamically to control aberrations. By adjusting parameters such as the size of the focal spot and maintaining alignment during scanning, the system adapts the optical characteristics to compensate for aberrations, improving measurement precision without requiring a completely complex optical design.

Inventive Principle:
Principle #35Parameter changes

2Area of stationary object

If the optical beam is scanned to measure overlay characteristics, then the measurement coverage is improved, but optical aberrations affect image quality

Engineering Contradiction:
Improvemeasurement coverage areaVSAvoidimage quality
Core Design Contradiction:
Area of stationary objectVSMeasurement precision

Solution Approach 1:

The patent employs dynamic control during scanning operations. The scanning system dynamically adjusts the optical beam parameters while maintaining alignment with the optical axis, allowing the system to cover larger areas through scanning while compensating for aberrations that would otherwise degrade image quality across the measurement coverage area.

Inventive Principle:
Principle #15Dynamics

3Adaptability or versatility

If off-axis images are used for overlay measurement, then the measurement capability is enhanced, but optical aberrations degrade image quality

Engineering Contradiction:
Improveoverlay measurement capabilityVSAvoidoff-axis image quality
Core Design Contradiction:
Adaptability or versatilityVSMeasurement precision

Solution Approach 1:

The system uses feedback from the detected signal beam to control and compensate for optical aberrations in off-axis images. The processor analyzes the overlay characteristics from the off-axis measurements and uses this information to adjust the optical system, thereby maintaining the versatility of off-axis imaging while improving image quality through closed-loop control.

Inventive Principle:
Principle #23Feedback

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enhances image quality and focus in overlay systems by effectively controlling optical aberrations, improving the accuracy of overlay measurements.

Implementation Method 1

a signal beam generated from the target structure during scanning of the optical beam. The signal beam comprises at least a scattered beam generated from the target structure

Methodology Applied
Scientific EffectReflection: Reflection

Implementation Method 2

The scanning system scans the optical beam and controls a size of a focal spot of the optical beam onto the target structure

Methodology Applied
Scientific EffectFocusing: Focusing

Data Source

PatentUS20260071972A1Lithographic apparatus, metrology systems for controlling optical aberrations, and method thereof
Publication Date: 2026.03.12 ASML NETHERLANDS BV
  • US20260071972A1 patent drawing
  • US20260071972A1 patent drawing
  • US20260071972A1 patent drawing

AI summary

A system includes an illumination system, a scanning system, an optical system, a detector system, and a processor. The illumination system directs an optical beam to illuminate a target structure. The scanning system scans the optical beam and controls a size of a focal spot of the optical beam onto the target structure. The optical system maintains an alignment with an optical axis of the system during scanning of the optical beam. The detector system detects a signal beam generated from the target structure during scanning of the optical beam. The signal beam comprises at least a scattered beam generated from the target structure. The processor analyzes the detected signal beam to determine an overlay characteristic of the target structure.