OVJP Fluidic Shutter Eliminates Mechanical Parts

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Solution Overview

Problem

Existing Organic Vapor Jet Printing (OVJP) systems lack an efficient mechanism for controlling the deposition of organic materials, leading to difficulties in achieving precise patterning and high-resolution printing, particularly due to the limitations of mechanical shutters which are complex and prone to mechanical failure.

Innovation Solution

The implementation of a fluidic shutter system within the OVJP system, utilizing a geometry of microchannels and a blocking gas to redirect evaporated organic material into an exhaust line, allowing for precise control of organic material deposition without internal mechanical parts, using gases like xenon, krypton, or argon to decrease diffusivity and enhance shuttering speed.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If mechanical shutters are used to control organic material deposition, then deposition control is achieved, but device complexity increases and reliability decreases

Engineering Contradiction:
Improveshutter operation reliabilityVSAvoidmechanical shutter complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent replaces mechanical shutters with a fluidic shutter system that uses gas flow dynamics to control organic material deposition. The fluidic shutter employs a blocking gas stream that flows through microchannels to block or redirect the carrier gas carrying organic vapors, eliminating mechanical moving parts while achieving reliable deposition control.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The invention uses pneumatic principles by employing gas flow dynamics to control material deposition. The fluidic shutter utilizes a blocking gas (such as nitrogen or other inert gases) that flows through microchannels to block or redirect the carrier gas stream, enabling reliable on/off control without mechanical components.

Inventive Principle:
Principle #29Pneumatics and hydraulics

2Manufacturing precision

If mechanical shutters are used for patterning control, then deposition control is achieved, but manufacturing precision deteriorates due to mechanical limitations

Engineering Contradiction:
Improvepatterning precisionVSAvoidshutter mechanism complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent replaces mechanical shutters with a fluidic shutter system that uses gas flow dynamics to control organic material deposition. The fluidic shutter employs a blocking gas stream that flows through microchannels to block or redirect the carrier gas carrying organic vapors, eliminating mechanical moving parts while achieving reliable deposition control.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The fluidic shutter divides the gas flow path into multiple microchannels, allowing independent control of each channel's flow. This segmentation enables precise spatial control of organic material deposition by selectively blocking or opening specific microchannels, achieving high patterning precision without mechanical complexity.

Inventive Principle:
Principle #1Segmentation

3Productivity

If conventional deposition control methods are used, then basic deposition is achieved, but productivity decreases due to slow shuttering speed

Engineering Contradiction:
Improvedeposition speedVSAvoidshuttering time
Core Design Contradiction:
ProductivityVSLoss of time

Solution Approach 1:

The invention uses pneumatic principles by employing gas flow dynamics to control material deposition. The fluidic shutter utilizes a blocking gas (such as nitrogen or other inert gases) that flows through microchannels to block or redirect the carrier gas stream, enabling reliable on/off control without mechanical components.

Inventive Principle:
Principle #29Pneumatics and hydraulics

Solution Approach 2:

The patent changes the physical parameters of the gas flow system by using a blocking gas with different flow characteristics than the carrier gas. By adjusting the flow rate, pressure, and type of blocking gas, the system achieves rapid shuttering speeds of 10-20 milliseconds, significantly improving productivity compared to mechanical shutters.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enables rapid and precise control over organic material deposition, improving the resolution and efficiency of the OVJP process by eliminating the need for mechanical shutters and ensuring reliable operation, with the fluidic shutter effectively shutting off organic material flow within 10-20 milliseconds.

Implementation Method 1

The blocking gas may decrease a diffusivity of the carrier-organic mixture into a blocking stream

Methodology Applied
Scientific EffectDiffusivity: Diffusion

Data Source

PatentUS20250024746A1Organic vapor jet printing system
Publication Date: 2025.01.16 THE REGENTS OF THE UNIVERSITY OF MICHIGAN INNOVATION PARTNERSHIPS
  • US20250024746A1 patent drawing
  • US20250024746A1 patent drawing
  • US20250024746A1 patent drawing

AI summary

Embodiments of the disclosed subject matter provide an organic vapor jet printing (OVJP) system having a printhead that include a fluidic shutter comprising a plurality of microchannels that are in fluidic communication with one another, and a micronozzle array connected to the fluidic shutter. The plurality of microchannels include a first microchannel to receive the carrier-organic mixture, a second microchannel to receive a blocking gas, a third microchannel connected to the micronozzle array, and a fourth microchannel connected to an exhaust line. The carrier-organic mixture may be deposited on a substrate when the apparatus operates in a first operating mode, and the blocking gas may direct evaporated organic material of the carrier-organic mix to the exhaust line when the apparatus operates in a second operating mode.