Oxide Semiconductor Memory Cell With Capacitor for Nonvolatile Rewriting

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Solution Overview

Problem

Existing volatile memory devices require frequent refresh operations due to leakage currents and power loss, while non-volatile memory devices face limitations in rewrite cycles and high voltage requirements, making them unsuitable for frequent data rewriting.

Innovation Solution

A semiconductor device using a highly purified oxide semiconductor transistor with extremely low off-current, integrated with a capacitor, allowing data storage without power supply and unlimited rewrite cycles, eliminating the need for high voltage and refresh operations.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Speed

If a volatile memory device (DRAM) is used to store data, then data can be accessed quickly, but leakage current causes charge loss requiring frequent refresh operations and limiting data storing time

Engineering Contradiction:
Improvedata access speedVSAvoiddata storing time
Core Design Contradiction:
SpeedVSDuration of action of stationary object

Solution Approach 1:

The invention changes the material parameter of the transistor from conventional semiconductor to highly purified oxide semiconductor, which fundamentally alters the electrical characteristics to achieve extremely low off-state current (1×10^-21 to 1×10^-24 A), enabling long-term data retention without refresh operations while maintaining fast access speeds

Inventive Principle:
Principle #35Parameter changes

2Duration of action of stationary object

If a non-volatile memory device (flash memory) is used to store data for long time, then data storing time is extremely long, but tunneling current deteriorates the gate insulating layer after predetermined writing operations

Engineering Contradiction:
Improvedata storing timeVSAvoidmemory element lifetime
Core Design Contradiction:
Duration of action of stationary objectVSReliability

Solution Approach 1:

The invention changes the transistor material to highly purified oxide semiconductor, which eliminates the tunneling current problem that causes gate insulating layer deterioration in flash memory, while maintaining non-volatile data storage capability through extremely low leakage current

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The invention uses a composite structure combining oxide semiconductor transistor with floating gate and control gates, integrating the advantages of both volatile and non-volatile memory technologies to achieve unlimited rewrite cycles with long data retention

Inventive Principle:
Principle #40Composite materials

3Use of energy by stationary object

If flash memory is used for non-volatile storage, then refresh operation is not needed, but high voltage is necessary for charge holding and removal requiring additional circuitry

Engineering Contradiction:
Improvepower consumptionVSAvoidcircuit complexity
Core Design Contradiction:
Use of energy by stationary objectVSDevice complexity

Solution Approach 1:

The invention changes the transistor material to highly purified oxide semiconductor with extremely low off-state current, which enables charge retention without high voltage, eliminating the need for complex high voltage generation circuits while maintaining non-volatile storage functionality

Inventive Principle:
Principle #35Parameter changes

4Ease of manufacture

If conventional semiconductor transistor is used, then manufacturing is straightforward, but leakage current limits data storing time and requires refresh operations

Engineering Contradiction:
Improvemanufacturing easeVSAvoiddata storing time
Core Design Contradiction:
Ease of manufactureVSDuration of action of stationary object

Solution Approach 1:

The invention changes the semiconductor material to highly purified oxide semiconductor, which can be manufactured using existing semiconductor fabrication processes (sputtering, CVD, ALD) while achieving fundamentally different electrical characteristics with extremely low leakage current for long-term data storage

Inventive Principle:
Principle #35Parameter changes

Data Source

PatentUS20250393311A1Semiconductor device
Publication Date: 2025.12.25 SEMICON ENERGY LAB CO LTD
  • US20250393311A1 patent drawing
  • US20250393311A1 patent drawing
  • US20250393311A1 patent drawing

AI summary

An object of the present invention is to provide a semiconductor device having a novel structure in which in a data storing time, stored data can be stored even when power is not supplied, and there is no limitation on the number of writing. A semiconductor device includes a first transistor including a first source electrode and a first drain electrode; a first channel formation region for which an oxide semiconductor material is used and to which the first source electrode and the first drain electrode are electrically connected; a first gate insulating layer over the first channel formation region; and a first gate electrode over the first gate insulating layer. One of the first source electrode and the first drain electrode of the first transistor and one electrode of a capacitor are electrically connected to each other.