Oxide Removal Cleaning Composition for OLED Mask Integrity
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Solution Overview
Problem
Conventional cleaning solutions fail to effectively remove oxides formed on mask base materials during the laser processing of organic light-emitting device (OLED) manufacturing, leading to contamination and reduced device performance.
Innovation Solution
A cleaning composition comprising an acid (organic or inorganic), a salt, and a surfactant in combination with water, which selectively removes oxides without damaging the mask base material, using a combination of acid-based reactions and surfactant-based prevention of reattachment.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional cleaning solutions (distilled water or alcohol) are used to clean the mask base material, then the cleaning process is simple and cost-effective, but the oxide formed during laser processing remains on the mask base material and cannot be removed
Solution Approach 1:
The cleaning composition uses a composite formulation combining multiple functional components: an acid component (for oxide dissolution), a surfactant (for contamination removal and wetting), and a solvent (for dissolving organic residues). This composite approach enables the single cleaning solution to remove oxides, organic contaminants, and inorganic impurities simultaneously, achieving comprehensive cleaning effectiveness that simple water or alcohol cannot provide.
Solution Approach 2:
The invention changes the chemical parameters of the cleaning solution by adjusting pH through acid components and modifying surface tension through surfactants. These parameter changes enable the solution to effectively interact with and remove oxides formed during laser processing, transforming the cleaning mechanism from simple physical rinsing to chemical dissolution and surfactant-mediated removal.
2Manufacturing precision
If a strong cleaning agent is used to remove oxides, then oxide removal effectiveness improves, but the mask base material may be damaged
Solution Approach 1:
The cleaning composition carefully controls the strength and pH of the acid component to achieve effective oxide removal while maintaining mask base material integrity. The surfactant and solvent components are selected to enhance cleaning effectiveness at moderate acid concentrations, allowing oxide removal without requiring excessively strong acids that could damage the mask material.
Solution Approach 2:
The surfactant acts as an intermediary that enhances the cleaning action of the acid component while protecting the mask base material. It facilitates the removal of oxides and contaminants through surface activity, allowing the acid to work more efficiently at lower concentrations, thereby preventing material damage while maintaining cleaning effectiveness.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The cleaning composition effectively removes oxides from mask base materials, maintaining their integrity and preventing reattachment, thereby enhancing the cleanliness and performance of OLED manufacturing processes.
Implementation Method 1
an acid component, which comprises at least one of an organic acid and an inorganic acid
Implementation Method 2
a surfactant component, which comprises at least one of an ionic surfactant and a nonionic surfactant
Data Source
AI summary
The present disclosure relates to a cleaning composition for removing an oxide including an acid selected from an organic acid, an inorganic acid, and a combination thereof; a salt selected from an organic salt, an inorganic salt, and a combination thereof; a surfactant; and water, and a method of cleaning using the cleaning composition.