Oxide Transistor Display Substrate Layout for Higher Yield
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Solution Overview
Problem
Existing display substrates using Low Temperature Poly-Silicon (LTPS) thin film transistors face decreased yield and high costs as the size of display substrates increases, leading to poor display performance.
Innovation Solution
A display substrate design incorporating a drive circuit layer with oxide transistors, including a plurality of circuit units and a net-like structure of signal lines, and a light emitting structure layer with oxide transistors, optimized for improved connectivity and efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If LTPS thin film transistors are used in display substrates, then display performance can be maintained, but manufacturing yield decreases and costs increase as substrate size increases
Solution Approach 1:
The patent changes the material parameter from LTPS to oxide semiconductor, which fundamentally alters the transistor characteristics. This parameter change enables high-performance displays while improving manufacturing yield and reducing costs, as oxide transistors can be manufactured with higher precision and lower defect rates
2Reliability
If LTPS thin film transistors are used in display substrates, then display performance can be maintained, but manufacturing costs increase as substrate size increases
Solution Approach 1:
The patent changes the material parameter from LTPS to oxide semiconductor, which fundamentally alters the transistor characteristics. This parameter change enables high-performance displays while improving manufacturing yield and reducing costs, as oxide transistors can be manufactured with higher precision and lower defect rates
3Reliability
If LTPS thin film transistors are used in display substrates, then display performance can be maintained, but manufacturing precision decreases as substrate size increases
Solution Approach 1:
The patent changes the material parameter from LTPS to oxide semiconductor, which fundamentally alters the transistor characteristics. This parameter change enables high-performance displays while improving manufacturing yield and reducing costs, as oxide transistors can be manufactured with higher precision and lower defect rates
Data Source
AI summary
A display substrate, a preparation method therefor, and a display apparatus. The display substrate comprises a drive circuit layer arranged on a base, the drive circuit layer comprising a plurality of circuit units, at least one scan signal line, and at least one data signal line; at least one circuit unit comprises a pixel drive circuit, the pixel drive circuit at least comprises a plurality of oxide transistors, and at least one oxide transistor is respectively connected to a scan signal line and a data signal line; in a direction perpendicular to the base, the drive circuit layer at least comprises, successively arranged in a direction away from the base, a first source/drain metal layer and a second source/drain metal layer, the first source/drain metal layer at least comprising a scan signal line, and the second source/drain metal layer at least comprising a data signal line.


