Oxide Insulating Film Bank Structure for OLED Subpixel Leakage
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Solution Overview
Problem
Existing display devices, particularly head-mounted displays (HMDs) using OLED technology, face challenges in reducing pixel intervals and maximizing light emission areas, which affects performance and resolution.
Innovation Solution
A display device design that includes a substrate with first and second subpixels, each equipped with a first electrode made of a metal material and an oxide insulating film covering the side of the electrode. This design minimizes the pixel interval and maximizes the light emission area without the need for separate banks between subpixels.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a separate bank is formed between subpixels to prevent leakage currents, then reliability is improved, but device complexity and manufacturing steps increase
Solution Approach 1:
The patent combines the bank structure with the oxide insulating film by forming the bank directly from the oxide layer that also serves as the insulating film. This integration eliminates the need for separate bank formation steps while maintaining the electrical isolation function, thus improving reliability without increasing device complexity
Solution Approach 2:
The oxide insulating film serves multiple functions: it acts as both the insulating layer and the bank structure between subpixels. This multi-functionality reduces the number of components needed while ensuring proper electrical isolation, resolving the contradiction between reliability and complexity
2Productivity
If the pixel interval is reduced to improve resolution, then productivity is improved, but manufacturing precision requirements increase
Solution Approach 1:
The oxide insulating film is formed in advance during the electrode fabrication process, establishing the bank structure before final pixel patterning. This preliminary action defines the pixel boundaries early, enabling tighter pixel spacing while maintaining manufacturing precision through controlled oxide formation
Solution Approach 2:
The patent utilizes plasma treatment parameters to precisely control the oxide layer thickness and lateral extent. By adjusting plasma power, time, and gas flow, the bank dimensions are precisely controlled, enabling reduced pixel intervals while maintaining manufacturing precision
3Illumination intensity
If the light emission area is maximized to improve brightness, then illumination intensity is improved, but the risk of leakage current between subpixels increases
Solution Approach 1:
The oxide insulating film is applied locally at the boundaries between subpixels rather than uniformly across the entire electrode area. This localized application maintains large light emission areas within each subpixel while providing targeted electrical isolation where needed, preventing leakage currents without compromising brightness
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The proposed solution effectively reduces the pixel interval, enhances light emission area, simplifies the manufacturing process, and lowers production costs while preventing leakage currents between subpixels.
Implementation Method 1
an oxide insulating film provided to cover at least a portion of a side of the first electrode and made of a second material. The first material is a metal material, and the second material is an oxide of the first material.
Implementation Method 2
performing plasma treatment for the reflective electrode material layer, the first stack and the charge generating layer, which are provided between the first subpixel and the second subpixel
Data Source
AI summary
A display device is disclosed, which may reduce an interval between subpixels and maximize a light emission area. The display device comprises a substrate provided with a first subpixel and a second subpixel arranged to adjoin the first subpixel, a first electrode provided in each of the first subpixel and the second subpixel on the substrate, including a first material, and an oxide insulating film provided to cover at least a portion of a side of the first electrode and made of a second material. The first material is a metal material, and the second material is an oxide of the first material.