Oxide Spacing Area Identification via Pattern Density Analysis

The patent transforms the approach from using fixed regular patterns to using extracted parameters (pattern density, spacing area dimensions, step height) that can vary according to actual product characteristics. By changing from a fixed model to a parameter-based model that adapts to different pattern densities and spacing configurations, the solution maintains accuracy while improving applicability to irregular product patterns.

The patent segments the complex irregular product patterns into discrete measurable elements: pattern density values, spacing area locations, spacing area widths, and step heights. By breaking down the irregular patterns into standardized parameter categories, the system can accurately extract and measure each element independently, maintaining precision even when overall patterns are irregular and inconsistent.

The patent applies different spacing area width requirements to different local regions based on their specific pattern density and step height characteristics. Rather than uniformly increasing spacing width everywhere, the system identifies high-risk locations with large step heights and targets those specific areas for spacing width adjustment. This localized approach prevents dishing defects where needed while maintaining tighter spacing control in areas where it is safe, thus preserving manufacturing precision.