Oxide TFT Region Layout to Balance Display Resolution and Power

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Solution Overview

Problem

Current display apparatuses face inefficiencies due to differences in driving properties between thin film transistors in display and non-display areas, leading to suboptimal performance in resolution and power consumption.

Innovation Solution

A display apparatus is designed with a bottom gate type thin film transistor in the display area for high resolution and a top gate type thin film transistor in the non-display area, both using oxide semiconductor materials, to optimize efficiency and reduce power consumption by preventing parasitic cap formation.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If a bottom gate type thin film transistor is used in the display area, then the area occupied by the transistor is reduced enabling high resolution, but the transistor may generate parasitic cap leading to increased power consumption

Engineering Contradiction:
Improvedisplay resolutionVSAvoidpower consumption
Core Design Contradiction:
Manufacturing precisionVSLoss of energy

Solution Approach 1:

The patent applies different transistor structures to different functional areas: bottom gate type TFTs in the display area for high resolution, and top gate type TFTs in the non-display area for low power consumption. This local differentiation resolves the contradiction by optimizing each area for its specific requirements rather than using a uniform structure throughout.

Inventive Principle:
Principle #3Local quality

2Loss of energy

If a top gate type thin film transistor is used in the non-display area, then power consumption is reduced by preventing parasitic cap formation, but the transistor occupies larger area reducing integration density

Engineering Contradiction:
Improvepower consumptionVSAvoidtransistor area
Core Design Contradiction:
Loss of energyVSArea of stationary object

Solution Approach 1:

The patent strategically places top gate type TFTs only in the non-display area where power consumption is critical, while accepting the larger area requirement. This localized application resolves the contradiction by matching the transistor structure to the specific functional demands of each region.

Inventive Principle:
Principle #3Local quality

3Ease of manufacture

If the same thin film transistor type is used in both display and non-display areas, then manufacturing is simplified, but driving efficiency is reduced due to different functional requirements

Engineering Contradiction:
Improvemanufacturing simplicityVSAvoiddriving efficiency
Core Design Contradiction:
Ease of manufactureVSProductivity

Solution Approach 1:

The patent differentiates transistor types by location: bottom gate for display pixels requiring high switching speed and small area, top gate for peripheral circuits requiring low power consumption. This resolves the contradiction by prioritizing driving efficiency through localized optimization rather than uniform manufacturing simplicity.

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The patent segments the display apparatus into functional zones (display area vs. non-display area) and assigns different transistor structures to each zone. This segmentation allows each region to be optimized for its specific function while maintaining overall system integration.

Inventive Principle:
Principle #1Segmentation

Data Source

PatentUS11903283B2Display apparatus comprising different types of thin film transistors with compact design and method for manufacturing the same
Publication Date: 2024.02.13 LG DISPLAY CO LTD
  • US11903283B2 patent drawing
  • US11903283B2 patent drawing
  • US11903283B2 patent drawing

AI summary

A method for manufacturing a display apparatus can include providing a first gate electrode on a substrate; providing a first active layer which overlaps with a portion of the first gate electrode; providing a second active layer on the substrate spaced apart from the first active layer; providing a first source electrode and a first drain electrode connected with the first active layer; providing a second gate electrode which overlaps with at least a portion of the second active layer; providing a second source electrode and a second drain electrode connected with the second active layer. Also, the method includes selectively providing conductivity to the second active layer, in which the first source electrode, the first drain electrode, the second gate electrode, the second source electrode, and the second drain electrode are manufactured at a same time.