Oxide Semiconductor Transistor Structure for Higher Mobility

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Solution Overview

Problem

Current display devices' transistors face limitations in carrier mobility, particularly in thin film transistors used for display devices, which affect the efficiency and performance of pixel circuits in emitting light.

Innovation Solution

A transistor structure is developed with a triple-layer configuration of a conductor/semiconductor/conductor, where the semiconductor layer is made of oxide semiconductor materials like InSnGaZnO, and the conductor layers include indium tin oxide or indium zinc oxide, with specific thicknesses and configurations to enhance carrier mobility.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a conventional thin film transistor structure is used, then the device complexity is low, but the carrier mobility is insufficient

Engineering Contradiction:
Improvecarrier mobilityVSAvoidtransistor structure complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The active layer is segmented into multiple functional layers: a first conductor layer (source/drain electrode), a semiconductor layer (channel), and a second conductor layer (source/drain electrode). This segmentation allows each layer to be optimized independently for its specific function, improving overall carrier mobility while maintaining manageable structural complexity

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The transistor employs composite material structure with oxide semiconductor materials (such as In-Ga-Zn-O) combined with metal layers. This composite approach leverages the high carrier mobility of oxide semiconductors and the excellent conductivity of metal layers, achieving superior electrical performance

Inventive Principle:
Principle #40Composite materials

2Power

If the semiconductor layer thickness is increased, then the current flow capability improves, but the leakage current increases

Engineering Contradiction:
Improvecurrent flow capabilityVSAvoidleakage current
Core Design Contradiction:
PowerVSLoss of energy

Solution Approach 1:

The patent optimizes the thickness parameter of the semiconductor layer to a specific range (1 nm to 10 nm). This parameter optimization achieves a balance between allowing sufficient current flow through the channel and maintaining adequate barrier properties to prevent leakage current, resolving the contradiction between power capability and energy loss

Inventive Principle:
Principle #35Parameter changes

Data Source

PatentUS20240014325A1transistor
Publication Date: 2024.01.11 SAMSUNG DISPLAY CO LTD
  • US20240014325A1 patent drawing
  • US20240014325A1 patent drawing
  • US20240014325A1 patent drawing

AI summary

A transistor is disclosed that includes an active layer and a gate electrode. The active layer includes a first conductor layer including metal atoms, a layer of semiconductor material disposed above the first conductor layer, and a second conductor layer disposed above the semiconductor material layer and including the metal atoms. The gate electrode overlaps a part of the active layer and is electrically insulated from the active layer.