Oxynitride Capping Structure for Crack-Resistant Die Bonding
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Solution Overview
Problem
The challenge in semiconductor manufacturing lies in minimizing development of cracks and enhancing the overall strength of stacked and bonded semiconductor devices, particularly in wafer-level packaging where sophisticated bonding processes are used to integrate active circuits on separate substrates.
Innovation Solution
Incorporating a capping member with an oxynitride layer surrounding the die structure to improve structural integrity, combined with an insulating member, which includes layers with varying oxygen and nitride content to enhance bonding and reduce crack formation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If sophisticated bonding processes are used to integrate active circuits on separate substrates, then integration density is improved, but crack development occurs and structural strength deteriorates
Solution Approach 1:
The capping member is divided into multiple layers including an oxynitride layer and other dielectric layers, each serving specific functions. This segmentation allows the structure to accommodate thermal expansion differences and stress variations between bonded substrates, preventing crack propagation while maintaining high integration density through sophisticated bonding processes
Solution Approach 2:
The capping member utilizes composite material structure combining oxynitride layer with other dielectric materials. This composite approach provides both mechanical strength to prevent cracking and appropriate dielectric properties for electrical isolation, enabling the structure to withstand the stresses introduced by sophisticated bonding processes while maintaining integration density
2Volume of moving object
If wafer-level packaging techniques are employed, then device miniaturization is achieved, but crack formation increases and reliability deteriorates
Solution Approach 1:
The oxynitride layer in the capping member acts as a preventive measure against crack formation. By incorporating this layer before final device assembly and bonding, the structure is pre-conditioned to resist thermal and mechanical stresses, cushioning against potential crack initiation and propagation that would otherwise compromise device reliability in miniaturized wafer-level packaging
Data Source
AI summary
The semiconductor structure includes a die structure including: a substrate, a first dielectric disposed over the substrate, a first interconnect structure disposed within the first dielectric, a second dielectric disposed on the first dielectric, and a conductive pad surrounded by the second dielectric, a capping member surrounding the die structure, and an insulating member surrounding the capping member, wherein the capping member includes a first oxynitride layer in contact with the die structure or the insulating member.


