Semiconductor Package ESD Protection via Merged Redistribution Lines

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Semiconductor packages are vulnerable to overvoltage or undervoltage conditions, such as electrostatic discharge (ESD), which can damage electronic circuits and affect their operation, and existing protection circuits are inadequate in addressing these issues effectively.

Innovation Solution

A package structure incorporating a semiconductor device, through-vias, dielectric layers, and a second molding compound, with redistribution lines that include an ESD-protection feature or a metal-insulator-metal (MIM) feature, providing protection against ESD and enhancing the reliability of the semiconductor device.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If conventional packaging structures are used, then manufacturing simplicity is maintained, but the semiconductor device is vulnerable to ESD damage and voltage fluctuations

Engineering Contradiction:
Improveprotection against ESDVSAvoidpackage structure
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent combines ESD protection functionality with the redistribution line structure by integrating an ESD-protection layer into the packaging structure. The ESD-protection layer is formed over the semiconductor device and extends into the molding compound, merging the protection function with the existing interconnection structure rather than adding a separate protection system.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The redistribution line structure serves multiple functions: electrical interconnection between layers and ESD protection. The ESD-protection layer integrated into the redistribution line provides both signal routing and voltage surge protection, making the structure multi-functional and reducing the need for separate protection circuits.

Inventive Principle:
Principle #6Universality (Multi-functionality)

2Reliability

If ESD protection features are integrated into redistribution lines, then protection effectiveness is improved, but manufacturing complexity increases

Engineering Contradiction:
Improveprotection against voltage fluctuationsVSAvoidfabrication process
Core Design Contradiction:
ReliabilityVSEase of manufacture

Solution Approach 1:

The ESD-protection layer is formed over the semiconductor device before the molding compound is applied, establishing the protection structure in advance. This preliminary formation allows the protection layer to be integrated into subsequent manufacturing steps without requiring additional complex processes.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The ESD-protection layer extends into the molding compound beyond the device boundaries, changing the spatial parameters of the protection structure. This extension allows the same layer to serve both as an interconnection element and an ESD protection element, achieving multiple functions without proportionally increasing manufacturing complexity.

Inventive Principle:
Principle #35Parameter changes

Data Source

PatentUS11088095B2Package structure
Publication Date: 2021.08.10 NAN YA TECH
  • US11088095B2 patent drawing
  • US11088095B2 patent drawing
  • US11088095B2 patent drawing

AI summary

The present disclosure relates to a package structure. The package structure includes a semiconductor device, a first molding compound, a through-via, first and second dielectric layers, and a second molding compound in contact with a sidewall of the first dielectric layer. The first molding compound is in contact with a sidewall of the semiconductor device. The through-via is formed in the first molding compound and electrically connected to the semiconductor device. The first and second dielectric layers are formed at upper and lower sides of the semiconductor device. The at least one redistribution line is formed in the first dielectric layer and electrically connected to the semiconductor device and the through-via. The second molding compound is in contact with a sidewall of the first dielectric layer. The at least one redistribution line comprises an ESD-protection feature or a MIM (metal-insulator-metal) feature.