Pantograph Projection for Long-Armed Sewing Machines

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Traditional quilting methods using pantograph patterns require operators to be positioned at the rear of the sewing machine, leading to difficulties in aligning patterns, potential damage to paper templates, and errors from misaligning lasers, necessitating a solution that allows front operation and eliminates the need for lasers.

Innovation Solution

A long-armed sewing machine with a computer device and projection units mounted above or on the sewing head projects pantograph patterns, allowing the needle and thread to trace the pattern directly from the front, using measurement devices for continuous adjustment and eliminating the need for rear operation and lasers.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of operation

If the operator positions at the rear of the stitcher to operate pantograph functions, then the machine can trace patterns using a laser, but the operator experiences difficulty aligning patterns and lasers, and paper patterns may become damaged

Engineering Contradiction:
Improvepattern alignment easeVSAvoidpattern alignment accuracy
Core Design Contradiction:
Ease of operationVSReliability

Solution Approach 1:

The patent inverts the traditional rear operation approach by enabling front operation of the stitcher. The operator stands at the front and guides the needle to trace the projected pattern, eliminating the need to position at the rear and struggle with alignment. This inversion directly resolves the contradiction by making operation easier while improving alignment accuracy.

Inventive Principle:
Principle #13The other way round (Inversion)

Solution Approach 2:

The patent uses a projection unit to create an optical copy of the pattern that is projected onto the fabric. This eliminates the need for physical paper patterns that can be damaged during positioning. The projected pattern serves as a durable, reusable template that maintains its integrity throughout the quilting process.

Inventive Principle:
Principle #26Copying

2Productivity

If a laser is used to trace pantograph patterns from the rear, then pattern tracing is enabled, but misalignment errors occur and the laser requires additional positioning complexity

Engineering Contradiction:
Improvepattern tracing capabilityVSAvoidpattern tracing accuracy
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

By inverting the operation position from rear to front, the patent eliminates the cumulative alignment errors that occur when positioning lasers and paper patterns from the rear. The front operation allows direct visual alignment of the projected pattern with the needle path, significantly improving tracing accuracy.

Inventive Principle:
Principle #13The other way round (Inversion)

Solution Approach 2:

The patent replaces the mechanical alignment system (requiring manual positioning of paper patterns and laser alignment) with an optical projection system. The projection unit displays the pattern directly onto the fabric, eliminating mechanical alignment steps and their associated errors.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

3Ease of operation

If paper patterns are used for pantograph tracing, then the pattern can be traced, but the patterns become damaged or torn during positioning and storage is difficult

Engineering Contradiction:
Improvepattern positioning easeVSAvoidpattern damage
Core Design Contradiction:
Ease of operationVSObject-affected harmful factors

Solution Approach 1:

The patent creates an optical copy of the pattern through the projection unit, eliminating the need for physical paper patterns. This projected pattern can be displayed repeatedly without degradation, eliminating damage and tearing issues associated with handling paper templates during positioning and storage.

Inventive Principle:
Principle #26Copying

Solution Approach 2:

The patent replaces the mechanical handling of paper patterns with an optical projection system. The pattern is projected onto the fabric rather than being manually positioned on it, eliminating the mechanical stress and handling that cause paper damage and make storage difficult.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

4Adaptability or versatility

If the operator operates from the rear of the machine, then pantograph functions can be performed, but additional room is required at the rear and control devices become duplicative

Engineering Contradiction:
Improvepantograph function capabilityVSAvoidcontrol device arrangement
Core Design Contradiction:
Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The patent inverts the operator position from rear to front, eliminating the need for additional rear space and reducing the complexity of control device arrangement. All control functions can be accessed from the front where the operator naturally stands, simplifying the overall device layout and eliminating duplicative controls.

Inventive Principle:
Principle #13The other way round (Inversion)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This method simplifies pattern alignment, reduces damage to patterns, and minimizes errors by enabling front operation and eliminating the need for lasers, enhancing the efficiency and accuracy of quilting.

Implementation Method 1

The one or more projection units include projection elements that may be LCD, DLP, CRT, laser, or other projection element types

Methodology Applied
Scientific EffectProjection:

Data Source

PatentUS9650734B2Pantograph projection
Publication Date: 2017.05.16 GAMMILL
  • US9650734B2 patent drawing
  • US9650734B2 patent drawing
  • US9650734B2 patent drawing

AI summary

The present invention relates to a sewing machine, specifically a long-armed stitcher. The present invention includes a computer device that may store pantograph patterns therein. The data including the pantograph patterns may be sent to projection units associated with the sewing machine head of the long-armed stitcher. The projection units use projection elements to project the pantograph patterns on the fabric to be stitched, allowing an operator of the stitcher to trace the projected pattern with a needle associated with the sewing machine head. Measurement devices associated with the sewing machine head determine head movement and alter the projected pattern accordingly such that the needle of the sewing head may continue to follow the pantograph pattern despite the head having moved in order to trace the pattern.