Parallax Barrier Formation on Thinned Substrates
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Solution Overview
Problem
The existing methods for manufacturing liquid crystal display (LCD) apparatus with a parallax barrier layer are prone to pattern defects due to unevenness or scratches on the substrate surface, leading to brightness point defects, as the exposure process is affected by foreign materials and glass scratches, resulting in inadequate light illumination and incorrect development of the parallax barrier pattern.
Innovation Solution
A method involving the formation of a display apparatus with a parallax barrier layer and a light transmission layer stacked on a substrate, where the light transmission layer acts as a protective layer to prevent defects by ensuring sufficient light illumination and using a photosensitive resin film with positive or negative photosensitivity, and the parallax barrier layer is formed on the outer surface of the cell substrate after bonding and thinning the substrates, reducing the impact of substrate imperfections.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Length of stationary object
If the substrate is thinned by polishing before forming the parallax barrier, then the substrate thickness is reduced, but pattern defects occur due to surface unevenness and scratches
Solution Approach 1:
The parallax barrier pattern is formed on the substrate surface before the thinning process. This preliminary action ensures that the pattern is created on a relatively smooth surface, avoiding the problems of surface unevenness and scratches that occur when patterning is done after polishing. The pattern formation is performed as a preliminary step before the substrate thickness reduction process.
Solution Approach 2:
The conventional sequence of operations is inverted: instead of thinning the substrate first and then forming the parallax barrier pattern, the patent forms the pattern first and then performs the thinning process. This reversal of the operation sequence eliminates the harmful effects of surface defects on pattern quality while still achieving the desired thin substrate thickness.
2Reliability
If exposure is performed on a polished substrate with foreign materials, then the parallax barrier is formed, but brightness point defects occur due to insufficient light illumination
Solution Approach 1:
The parallax barrier pattern is formed as a preliminary layer before the thinning process. This ensures that the exposure process occurs on a surface without the harmful effects of polishing-induced unevenness and scratches, guaranteeing sufficient and uniform light illumination during exposure.
Solution Approach 2:
The parallax barrier layer is formed beforehand to cushion or protect against the potential harmful effects of surface defects. By establishing the pattern before thinning, the system preemptively avoids the light illumination problems that would occur with exposure on a polished surface containing foreign materials and scratches.
3Length of stationary object
If the parallax barrier is formed after substrate thinning, then the substrate can be thinned effectively, but productivity is reduced due to additional polishing operations
Solution Approach 1:
The parallax barrier formation process is merged with the substrate processing sequence in an optimized manner. By forming the pattern before thinning, the patent combines the pattern formation step with the early stages of substrate processing, eliminating the need for separate post-thinning patterning operations and improving overall manufacturing efficiency.
Solution Approach 2:
The parallax barrier pattern is formed as a preliminary action before the substrate thinning process. This preliminary formation allows the subsequent thinning operation to proceed without the need for additional patterning steps, thereby improving productivity by reducing the total number of manufacturing operations required.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach effectively suppresses brightness point defects and improves manufacturing productivity by ensuring accurate pattern formation and light blocking, even in the presence of substrate imperfections, by using a laminated structure of parallax barrier and light transmission layers.
Implementation Method 1
bonding a first mother substrate and a second mother substrate to form a cell substrate
Implementation Method 2
the Bk resist in an area, which should not be dissolved under normal circumstances when a developing operation is performed by a photocrosslinking reaction, is dissolved
Data Source
AI summary
A method of manufacturing a display apparatus having a display material provided between a pair of substrates arranged to face each other, the method comprises: bonding a first mother substrate and a second mother substrate to form a cell substrate from which one or more panels are bring out; thinning one of the first mother substrate and the second mother substrate after forming the cell substrate; forming a parallax barrier layer that separates a display image and a light transmission layer to be stacked on the parallax barrier layer on a surface of the one of the first mother substrate and the second mother substrate at an outer-side face of the cell substrate; and dividing the cell substrate into one or more panels.