Parallel Accumulator Gas Delivery for Semiconductor Manufacturing
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Solution Overview
Problem
Existing semiconductor manufacturing processes face challenges in efficiently managing the flow of chemical compounds, particularly precursors, due to variations in flow rates and chemical compound properties, which can affect process throughput and uniformity.
Innovation Solution
The implementation of a semiconductor manufacturing apparatus with two or more accumulators connected in parallel allows for efficient and flexible delivery of process gases to the reaction chamber. This configuration enables continuous operation by allowing one accumulator to discharge while others are recharged, maintaining consistent flow and pressure.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a single accumulator is used to store and deliver chemical compounds, then the system structure is simple, but the throughput and continuous operation capability are limited
Solution Approach 1:
The system divides the accumulator function into multiple independent accumulators (first accumulator and second accumulator) that operate in parallel. Each accumulator can be independently charged and discharged, allowing continuous operation while maintaining manageable individual component sizes and structures.
Solution Approach 2:
Multiple accumulators are combined in parallel configuration to achieve higher overall throughput and continuous operation capability. The merging of multiple storage and delivery units creates a system that overcomes the limitations of a single accumulator while the modular design keeps individual components simple.
2Duration of action of moving object
If one accumulator is emptied and needs recharging, then the chemical compound delivery can continue, but the flow rate may be interrupted or reduced
Solution Approach 1:
The parallel accumulator configuration ensures continuous delivery of chemical compounds by having one accumulator discharge while another is charged. This eliminates interruptions in the useful action of compound delivery to the reaction chamber, maintaining continuous operation without flow rate reductions.
Solution Approach 2:
The second accumulator can be pre-charged with chemical compounds before the first accumulator is depleted. This preliminary action ensures that when switching between accumulators, the delivery flow rate is maintained without interruption or reduction, as the second accumulator is already prepared to take over immediately.
3Adaptability or versatility
If parameters such as temperature and pressure are adjusted to adapt flow rate, then the flow rate can be optimized for particular precursors, but the system flexibility is reduced
Solution Approach 1:
The system dynamically switches between multiple accumulators based on their charge status and the specific precursor delivery requirements. This dynamic operation allows adaptation of flow rates for different precursors while maintaining a relatively simple fixed physical configuration of the accumulator system.
Solution Approach 2:
The system adapts to different precursor requirements by changing operational parameters (which accumulator is active, timing of switches) rather than changing the physical structure. This allows flow rate optimization for various precursors while keeping the device configuration simple and modular.
Data Source
AI summary
In general, the various aspects of the technology of the present disclosure relate to semiconductor manufacturing apparatuses and processes which may comprise two or more accumulators connected in parallel to each other. The apparatus may have a solid-state precursor sublimator upstream from said two or more accumulators employed by the process.