Parallel Coil Power Distribution for Uniform Plasma Processing
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Solution Overview
Problem
Conventional plasma processing apparatuses exhibit low in-plane uniformity of plasma density, which affects the uniform processing of workpieces such as wafers.
Innovation Solution
The apparatus includes a plasma generation unit with a first coil and a distribution portion that divides high-frequency power equally among parallel conductors, ensuring equal lengths for branch lines to enhance plasma uniformity, and a second coil with a similar distribution mechanism to further improve uniformity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If coil segments have significantly different lengths, then the device complexity is reduced, but the in-plane uniformity of plasma density deteriorates
Solution Approach 1:
The coil is divided into multiple segments (first coil with first conductors, second coil with second conductors) with each segment having controlled path lengths. The distribution portion segments the power supply paths to ensure each coil segment receives power through paths of substantially equal length, thereby achieving uniform plasma density while maintaining a manageable device structure.
Solution Approach 2:
The invention controls the path length parameter of power supply lines to be substantially equal across all coil segments. By adjusting and equalizing the path lengths of power supply lines to each coil segment, the invention achieves uniform current distribution and thereby uniform plasma density across the processing chamber.
2Device complexity
If unequal power distribution paths are used, then the device complexity is reduced, but the uniformity of electric current across conductors deteriorates
Solution Approach 1:
The distribution portion is designed to create equipotential conditions across all power supply paths to the coil segments. By ensuring that all power supply lines have substantially equal lengths and are connected through the distribution portion, the invention achieves uniform electric potential and current distribution across all conductors, eliminating current imbalances that would otherwise occur with unequal path lengths.
3Ease of manufacture
If a simple coil configuration is used, then the ease of manufacture is improved, but the plasma generation uniformity deteriorates
Solution Approach 1:
The distribution portion acts as an intermediary component between the power supply and multiple coil segments. This intermediary structure equalizes the power distribution to each coil segment by controlling path lengths, thereby achieving uniform plasma generation without requiring complex individual coil designs. The intermediary distribution portion simplifies the overall manufacturing by providing a centralized power equalization function.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration significantly enhances the in-plane uniformity of plasma, leading to more consistent processing of workpieces by maintaining equal electric current paths and reducing magnetic field interference.
Implementation Method 1
a plasma generation unit that is provided on a side opposite to the chamber across the dielectric member, and generates a plasma in the chamber. The plasma generation unit includes: a first coil that includes a plurality of first conductors that are connected in parallel to each other
Implementation Method 2
a first distribution portion that distributes, to each of the first conductors, first high frequency power to be supplied to the first coil. The first distribution portion includes: a first input portion to which the first high frequency power is input; a first branch portion at which the first high frequency power input to the first input portion is divided and delivered into a plurality of first branch lines
Data Source
AI summary
A plasma generation unit includes: a first coil that includes first conductors that are connected in parallel to each other; and a first distribution portion that distributes, to each of the first conductors, first high frequency power to be supplied to the first coil. The first distribution portion includes: a first input portion to which the first high frequency power is input; a first branch portion at which the first high frequency power input to the first input portion is divided and delivered into first branch lines; and second branch portions at each of which a corresponding one of the first branch lines branches out into second branch lines. Each of the second branch lines is connected to one of first application portions that are included in the first conductors. The first branch lines have a substantially equal length. The second branch lines have a substantially equal length.