Parallel Gas Filtration for Stable Semiconductor Contaminant Sampling
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Solution Overview
Problem
Conventional gas sampling ports in semiconductor manufacturing environments are prone to plugging, require time-consuming purging, and disrupt pressure, leading to inaccurate contaminant monitoring and increased maintenance costs due to uneven gas flow and residual contaminants.
Innovation Solution
A system with parallel filter stages and a diffuser plate for uniform gas distribution, combined with a sampling tube orifice that maintains continuous, uniform gas flow to minimize contamination and pressure disruptions, allowing for efficient contaminant monitoring without purging.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If conventional sampling ports are used for gas flow monitoring, then gas quality can be monitored, but the ports plug during fabrication requiring time-consuming purging and causing pressure disruptions
Solution Approach 1:
The sampling system is segmented into multiple independent sampling ports distributed across different locations in the clean room. Each port operates independently, so if one plugs, others remain functional. This segmentation prevents complete system failure and reduces the impact of plugging events on overall monitoring reliability.
Solution Approach 2:
A sampling manifold acts as an intermediary device that collects gas samples from multiple ports and directs them to a central analysis system. The manifold includes purge channels that can clear contaminants without disrupting the main sampling function, serving as a mediator between the sampling ports and the analysis system while maintaining continuous operation.
2Measurement precision
If sampling ports are opened during fabrication for contaminant monitoring, then gas quality data can be obtained, but pressure changes occur that affect the fabrication process
Solution Approach 1:
Gas samples are continuously drawn through the sampling ports at a low, constant rate before any analysis is performed. This preliminary continuous sampling maintains a steady state flow that prevents pressure disruptions when samples are actually taken for analysis, as the sampling system is already primed and flowing.
Solution Approach 2:
The sampling system uses variable flow control to adjust sampling rates based on conditions. During critical fabrication processes, the sampling flow rate is reduced to minimal levels necessary for monitoring, thereby maintaining pressure stability while still obtaining contaminant data. The flow parameters are dynamically changed to balance monitoring needs with process stability.
3Productivity
If conventional single-stage filtration is used, then gas flow can be filtered, but filter changes are required frequently increasing maintenance costs
Solution Approach 1:
The filtration system is divided into multiple stages with different filter elements arranged in series. Each stage captures different types or sizes of contaminants, distributing the contaminant load across multiple filters rather than one. This segmentation allows filters to last longer and be replaced less frequently, reducing maintenance time and costs.
Solution Approach 2:
The multi-stage filtration system provides more filtration capacity than a single stage would require, using intermediate filtration stages to capture contaminants progressively. This excessive action in terms of filtration stages results in each individual filter experiencing less stress and lasting longer, reducing the frequency of replacements needed.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system effectively reduces contaminant levels, ensures accurate gas flow monitoring, and minimizes maintenance by maintaining continuous gas flow and preventing plugging, thereby improving semiconductor yields and reducing operational costs.
Implementation Method 1
a flow controller for distributing the gas flow among the filter stages
Implementation Method 2
a filter unit having at least two parallel filter stages located therein for removing at least a portion of the contaminants from the gas flowing therethrough
Implementation Method 3
a sampling tube orifice that maintains continuous, uniform gas flow to minimize contamination and pressure disruptions
Data Source
AI summary
The invention provides a system and method comprising an apparatus for removing contaminants from a gas in a semiconductor processing device, which can include a filter unit having at least two parallel filter stages located therein. The filter stages are designed to remove a least a portion of the contaminants present in the gas flowing through them. The apparatus can also include a flow controller for distributing the gas flow among the filter stages. In one embodiment, the controller may consist of a diffuser plate. The invention also provides a sampling tube orifice for gas flow control in a system or method of the invention. In another embodiment, an apparatus for removing contaminants from a gas in a clean room comprises a filter unit having at least two parallel filter stages, which are used to remove a portion of the contaminants in the gas as it passes through the apparatus.