Parallel Image Processing System for Lithography Mask Arrays
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Solution Overview
Problem
The semiconductor IC and FPD industries face challenges in maintaining cost efficiency and throughput while producing larger substrate sizes, with conventional lithography tools struggling to handle large masks effectively, leading to increased costs and process defects.
Innovation Solution
A parallel image processing system that includes a graphics engine to process graphical objects into convex polygons, distributed to scan line image processing units for parallel processing, synchronized using sentinels, and buffered for efficient image data storage and output, addressing issues of mask size, throughput, and process yield.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If conventional lithography tools use larger masks to process larger FPD substrates, then substrate size increases, but manufacturing cost increases and process defects increase
Solution Approach 1:
The patent segments the imaging process by using multiple smaller masks arranged in a mask array, where each mask handles a specific region of the substrate. This eliminates the need for a single large mask, reducing mask manufacturing cost while maintaining the ability to process large substrates through coordinated exposure of multiple mask regions.
Solution Approach 2:
The patent transitions from a single-plane mask system to a multi-plane mask array system, organizing masks in two-dimensional arrays that can be selectively positioned and activated. This dimensional reorganization allows processing of large substrate areas using multiple smaller mask elements rather than one large mask.
2Area of stationary object
If conventional lithography tools use larger masks to process larger FPD substrates, then substrate size increases, but process yield decreases due to increased defects
Solution Approach 1:
By dividing the substrate area into multiple regions, each handled by a separate mask in the array, the system isolates defects to specific mask regions rather than affecting the entire substrate. This segmentation prevents single-point failures from compromising overall process yield.
Solution Approach 2:
Each mask in the array is optimized for its specific regional exposure requirements, allowing tailored quality control for different substrate areas. Defects in one regional mask do not propagate to other regions, maintaining local quality standards across the entire large substrate.
3Productivity
If parallel processing is implemented to increase throughput, then productivity increases, but system complexity increases
Solution Approach 1:
The parallel processing system is segmented into independent mask array elements that can be controlled and processed separately. Each mask element operates as an independent processing unit, allowing parallel execution without requiring complex interdependencies between processing elements, thus managing system complexity.
Solution Approach 2:
The mask array system uses standardized, interchangeable mask elements that can be programmed and positioned to handle different imaging tasks. This universality allows the same hardware architecture to perform multiple functions through software control, reducing the need for specialized complex hardware for each processing function.
Data Source
AI summary
System and method for a parallel image processing mechanism for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, the parallel image processing system includes a graphics engine configured to partition an object into a plurality of trapezoids and form an edge list for representing each of the plurality of trapezoids, and a distributor configured to receive the edge list from the graphics engine and distribute the edge list to a plurality of scan line image processing units. The system further includes a sentinel configured to synchronize operations of the plurality of scan line image processing units, and a plurality of buffers configured to store image data from corresponding scan line image processing units and outputs the stored image data using the sentinel.