Parallel Imaging Writer System for Large Flat Panel Displays
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Solution Overview
Problem
Conventional lithography technologies for manufacturing flat panel displays (FPDs) face challenges in handling large mask sizes, leading to high costs and long delivery times due to stringent CD uniformity requirements and defect density control issues, which hinder the production of larger FPD substrates while maintaining throughput and process yield.
Innovation Solution
A parallel imaging writer system utilizing multiple spatial light modulator (SLM) units arranged in arrays, which processes mask data to partition patterns across different areas of the substrate, allowing for simultaneous imaging and multiple exposures to address CD uniformity and defect density issues, reducing the need for high-powered illumination sources and enabling more efficient mask production.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If conventional mask-based exposure tools are used for large FPD substrates, then the substrate size can be increased, but the mask production cost and time increase significantly due to stringent CD uniformity requirements and defect density control issues
Solution Approach 1:
The patent divides the large substrate area into multiple smaller imaging areas, each covered by a dedicated SLM imaging unit. This segmentation allows each SLM unit to independently pattern its designated area with standard CD uniformity requirements, rather than requiring one large mask to cover the entire substrate area with stringent uniformity specifications across the whole area.
Solution Approach 2:
The patent uses multiple SLM (spatial light modulator) units to create programmable virtual masks for each imaging area. These SLM-based virtual masks replace conventional physical masks, allowing rapid reconfiguration and elimination of mask manufacturing lead times and costs while maintaining pattern fidelity.
2Reliability
If conventional mask-based exposure tools are used, then the existing lithography process can be maintained, but the throughput decreases due to the time required to manufacture and handle large masks
Solution Approach 1:
The patent employs SLM units that are programmable and dynamically reconfigurable, allowing the mask patterns to be changed electronically without physical mask changes. This dynamic capability enables rapid switching between different patterns and areas, significantly increasing throughput while maintaining consistent patterning quality through digital control.
Solution Approach 2:
The parallel array of SLM imaging units operates simultaneously to pattern multiple areas of the substrate in one exposure cycle. This continuous parallel operation eliminates the sequential processing bottlenecks of conventional single-mask systems, maintaining consistent quality across all areas while achieving high throughput.
3Productivity
If high-powered illumination sources are used to maintain throughput with large masks, then the exposure speed can be maintained, but the system cost and energy consumption increase
Solution Approach 1:
The total substrate area is divided into multiple smaller imaging areas, each handled by a separate SLM imaging unit with its own illumination source. This segmentation allows each illumination source to operate at lower power levels while collectively covering the entire substrate area through parallel operation, reducing total energy consumption compared to a single high-powered source.
Solution Approach 2:
Multiple SLM imaging units with individual illumination sources are combined in a parallel array configuration. The collective output of these multiple lower-power illumination sources achieves the same total throughput as a single high-powered source, while consuming less energy and providing better load distribution.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system significantly reduces mask production costs and time, enhances CD uniformity, and improves throughput, enabling the production of larger FPD substrates with better yield and process window control, thus addressing the limitations of conventional mask-based exposure tools.
Implementation Method 1
A parallel imaging writer system utilizing multiple spatial light modulator (SLM) units arranged in arrays, which processes mask data to partition patterns across different areas of the substrate, allowing for simultaneous imaging and multiple exposures
Implementation Method 2
conventional lithography technologies for manufacturing flat panel displays (FPDs) face challenges in handling large mask sizes
Data Source
AI summary
System and method for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, the method includes providing a parallel imaging writer system having a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel arrays, receiving a mask data pattern to be written to a substrate, processing the mask data pattern to form a plurality of partitioned mask data patterns corresponding to different areas of the substrate, identifying objects in an area of the substrate to be imaged by corresponding SLMs, selecting evaluation points along edges of the objects, configuring the parallel imaging writer system to image the objects using the evaluations points, and performing multiple exposures to image the objects in the area of the substrate by controlling the plurality of SLMs to write the plurality of partitioned mask data patterns in parallel.