Parallel Imaging Writer System for Flat Panel Display Lithography
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Solution Overview
Problem
Conventional lithography technologies face challenges in cost-effectively manufacturing larger masks for Flat Panel Display (FPD) substrates, leading to increased mask costs and longer delivery times due to the need for high-powered illumination sources and complex exposure tool configurations, which impact throughput and yield in FPD manufacturing.
Innovation Solution
A parallel imaging writer system utilizing multiple compact spatial light modulator (SLM) imaging units with low-powered LED or diode laser illumination sources, arranged in arrays to project mask data patterns onto substrates in parallel, reducing the need for high-powered illumination and enabling faster mask writing with improved process window and yield.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If conventional projection exposure tools use high-powered illumination sources to write mask patterns, then throughput is improved, but device complexity and cost increase
Solution Approach 1:
The patent divides the mask writing system into multiple independent SLM imaging units arranged in arrays, where each unit can operate autonomously. This segmentation allows parallel processing of different mask regions, achieving high throughput without requiring a single complex high-powered illumination system.
Solution Approach 2:
The patent uses multiple compact SLM imaging units that create optical copies of the mask pattern simultaneously. Each imaging unit projects the same or different portions of mask data onto the substrate in parallel, eliminating the need for sequential exposure with a single complex tool.
2Speed
If conventional tools use high-powered illumination sources for mask writing, then exposure speed is improved, but manufacturing cost increases
Solution Approach 1:
The system segments the illumination function across multiple low-powered LED or diode laser sources, each associated with an individual SLM imaging unit. This approach achieves high overall exposure speed through parallel operation while using inexpensive, low-powered light sources that are easier and cheaper to manufacture than single high-powered sources.
Solution Approach 2:
The patent combines the output of multiple low-powered illumination sources operating in parallel to achieve the cumulative exposure effect previously requiring a single high-powered source. This merging of multiple simple, inexpensive components replaces the need for complex, expensive high-powered illumination systems.
3Area of stationary object
If conventional projection exposure tools are configured for large substrate processing, then substrate size capability is improved, but process window narrows
Solution Approach 1:
The patent divides the large substrate processing area into multiple smaller imaging zones, each handled by an individual SLM imaging unit. Each unit maintains a wide process window for its local region, and the parallel operation of multiple units across the entire substrate area achieves both large-area coverage and high manufacturing precision.
Solution Approach 2:
Each SLM imaging unit is optimized for its specific local imaging region, allowing independent tuning of illumination and focus parameters. This local optimization ensures that each zone maintains an wide process window, and the collective performance of all units achieves high precision across the entire large substrate area.
4Adaptability or versatility
If conventional mask-based exposure tools are used for FPD manufacturing, then existing process compatibility is maintained, but mask size and handling complexity increase
Solution Approach 1:
The patent extracts the mask pattern data from the physical mask and transfers it to digital form that can be directly loaded into the SLM imaging units. This eliminates the need for large physical masks and their associated handling complexity, while the SLM units reproduce the necessary patterns for FPD manufacturing processes.
Solution Approach 2:
The system creates digital copies of mask patterns that can be stored and reused without physical mask fabrication. The SLM imaging units optically reproduce these digital patterns as needed, eliminating the need for large physical masks and reducing mask handling complexity while maintaining process compatibility.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system achieves competitive throughput and cost-effectiveness by using a scalable array of compact SLM imaging units, reducing mask writing time and increasing lithography yield while maintaining a wider process window, thus addressing the limitations of conventional mask-based exposure tools.
Implementation Method 1
a plurality of micro mirrors configured to project light from the one or more illumination sources to the corresponding one or more projection lens
Implementation Method 2
low-powered LED or diode laser illumination sources
Data Source
AI summary
System and method for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, a parallel imaging writer system includes a plurality of spatial light modulator (SLM) imaging units, where each of the plurality of SLM imaging units includes one or more illumination sources, one or more alignment sources, one or more projection lenses, and a plurality of micro mirrors configured to project light from the one or more illumination sources to the corresponding one or more projection lens. The parallel imaging writer system further includes a controller configured to control the plurality of SLM imaging units, where the controller tunes each of the SLM imaging unit individually in writing a mask data to a substrate.