Parallel Linkage End Effector for CMP Pad Conditioning
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Solution Overview
Problem
Conventional CMP conditioning apparatuses face issues with imprecise control of conditioning pressure due to high internal friction, lack of force measurement, and position feedback, leading to inefficient and potentially damaging polishing pad conditioning.
Innovation Solution
A system with a linear actuator and parallel linkage assembly that allows precise vertical movement of the end effector, incorporating a force transducer for controlled conditioning pressure and position sensors for accurate positioning, minimizing vertical height and maintaining parallel orientation with the polishing pad.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional conditioning apparatuses are used to condition the polishing pad, then the polishing pad surface can be roughened to counter glazing, but the conditioning pressure control is imprecise due to high internal friction, leading to inefficient or potentially damaging conditioning
Solution Approach 1:
The patent replaces conventional mechanical linkage systems with high internal friction with a direct-drive mechanical system consisting of a linear actuator coupled to a conditioning arm. This substitution eliminates the friction losses present in traditional multi-component mechanical transmissions, enabling precise control of conditioning pressure while reducing energy waste.
Solution Approach 2:
The patent incorporates feedback mechanisms including position sensors to monitor the vertical position of the conditioning arm and force sensors to measure the conditioning pressure applied to the polishing pad. This feedback enables closed-loop control, allowing the system to maintain precise conditioning pressure by adjusting the linear actuator output based on real-time measurements, thereby resolving the imprecision caused by internal friction in conventional systems.
2Reliability
If conventional conditioning apparatuses apply conditioning pressure to roughen the polishing pad surface, then glazing can be counteracted, but there is a lack of force measurement and position feedback, leading to inefficient and potentially damaging conditioning
Solution Approach 1:
The patent implements comprehensive feedback systems with position sensors monitoring the vertical position of the conditioning arm and force sensors measuring the conditioning pressure. This feedback enables reliable, controlled conditioning by providing real-time data to adjust the linear actuator, ensuring consistent pressure application that effectively roughens the polishing pad surface without causing damage.
Solution Approach 2:
The patent replaces complex mechanical measurement and control systems with a simplified direct-drive architecture using a linear actuator. This substitution reduces device complexity while improving reliability, as the direct coupling between the actuator and conditioning arm eliminates the need for complex mechanical transmissions and associated measurement systems found in conventional apparatuses.
3Force
If conventional conditioning apparatuses use complex mechanical linkages to control end effector position, then vertical movement can be achieved, but high internal friction absorbs the force, reducing the actual conditioning pressure applied to the polishing pad
Solution Approach 1:
The patent replaces conventional mechanical linkage systems that absorb force through internal friction with a direct-drive system using a linear actuator. This substitution minimizes the number of mechanical components and contact points, thereby reducing frictional force absorption and maximizing the conditioning pressure transmitted to the polishing pad surface.
Solution Approach 2:
The patent extracts and removes the intermediate mechanical linkage components from the conditioning apparatus, directly coupling the linear actuator to the conditioning arm. This extraction eliminates the sources of internal friction present in traditional mechanical transmissions, ensuring that the full force generated by the actuator is transmitted to the end effector for effective conditioning pressure application.
4Reliability
If conventional conditioning apparatuses lack position feedback of the end effector, then the system structure can be simpler, but mechanical wear can cause undetected changes in end effector position, leading to damaged polishing pads or inefficient conditioning
Solution Approach 1:
The patent incorporates position feedback systems using sensors to monitor the vertical position of the conditioning arm and end effector. This feedback enables real-time detection of position changes caused by mechanical wear or other factors, allowing the control system to compensate and maintain accurate end effector positioning. This prevents undetected position drift that could lead to polishing pad damage or inefficient conditioning.
Data Source
AI summary
A system (46) for adjusting an end effector (48) of an apparatus (44) includes a linear actuator (58) attachable with an arm (52) of the apparatus (44). The system (46) further includes a first link member (64) having a first segment (68) operatively coupled with the linear actuator (58), and a second link member (66) maintained in parallel alignment with a second segment (70) of the first link member (64). The first and second link members (64, 66) pivotally attach to the end effector (48), and movement of the first segment (68) powered by the actuator (58) causes the first and second link members (64, 66) to pivot producing movement of the end effector (48) relative to a workpiece (26). A force transducer (76) interposed between the actuator (58) and the first link member (64) is utilized to control a pressure of the end effector (48) against the workpiece (26).