Parallel Marangoni Drying Module for Substrate Processing
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Solution Overview
Problem
Existing substrate processing systems face challenges in precisely positioning and transporting substrates in a vertical orientation without damaging them, especially when transitioning from horizontal to vertical, requiring high reliability and speed.
Innovation Solution
A parallel single substrate processing system with a flexible wafer holder mechanism using compliant flexures for secure gripping and precise alignment, combined with a transporter and loader module for efficient and safe handling of substrates, allowing for full immersion in fluids and agitation near the substrate surface.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If substrates are transported in vertical orientation, then processing efficiency and fluid immersion capability are improved, but positioning precision and substrate damage risk increase
Solution Approach 1:
The substrate holder is segmented into multiple fingers that can independently deflect and position themselves. Each finger can be precisely controlled to maintain accurate positioning of the substrate during vertical transport, while the overall structure enables efficient fluid immersion processing.
Solution Approach 2:
The substrate holder uses flexible fingers made of elastic material that can deflect to accommodate positioning requirements during vertical transport. This flexibility allows the holder to maintain precise substrate positioning while enabling the vertical orientation needed for processing efficiency and fluid immersion.
2Adaptability or versatility
If substrates are transported from horizontal to vertical orientation, then processing capability is improved, but transport reliability and substrate safety deteriorate
Solution Approach 1:
The substrate holder transitions from a static horizontal design to a dynamic vertical configuration with flexible fingers that can adapt during transport. The holder can deflect and reposition itself during the orientation change, maintaining substrate security and reliability while enabling vertical processing capability.
Solution Approach 2:
The system changes the orientation parameter from horizontal to vertical, and the holder compensates by changing its structural configuration through finger deflection. This parameter change enables vertical processing capability while the holder's adaptive response maintains transport reliability and substrate safety.
3Stability of the object's composition
If rigid substrate holders are used, then positioning stability is improved, but substrate damage risk and handling flexibility increase
Solution Approach 1:
The substrate holder uses flexible fingers made of elastic material instead of rigid structures. These flexible fingers can deflect to absorb shocks and prevent substrate damage, while maintaining positioning stability through controlled elasticity and precise finger positioning.
4Reliability
If flexible substrate holders are used, then handling safety is improved, but positioning precision deteriorates
Solution Approach 1:
The flexible holder is segmented into multiple independent fingers that can be individually controlled. This segmentation allows each finger to provide handling safety through flexibility while the collective positioning of multiple fingers maintains overall substrate positioning precision.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables precise and reliable processing of substrates in a vertical orientation, minimizing damage and ensuring high-speed, high-reliability transport and processing, with features like Marangoni drying and shear plate agitation for effective fluid management.
Implementation Method 1
Marangoni drying
Implementation Method 2
shear plate agitation
Data Source
AI summary
A substrate drying apparatus for drying a width of a surface of a substrate in a liquid. The substrate drying apparatus has a liquid tank containing the liquid. An injection nozzle is coupled to the liquid tank, the injection nozzle having a continuous knife edge injection surface across the width of the surface of the substrate. A drain is coupled to the injection nozzle, the drain having a continuous drain surface substantially parallel to the continuous knife edge injection surface and across the width of the surface of the substrate. The liquid forms a meniscus between the continuous drain surface and the width of the surface of the substrate. The injection nozzle directs a vapor at the meniscus.


