Parallel SLM Imaging Writer for Large Substrate Lithography
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Solution Overview
Problem
Conventional lithography technologies for manufacturing flat panel displays (FPDs) face challenges in handling larger mask sizes, leading to increased costs and longer delivery times due to tighter critical dimension (CD) specifications and defect density control issues, while also being limited by the size of physical masks which restrict the dimension of flexible displays that can be manufactured.
Innovation Solution
A parallel imaging writer system utilizing multiple spatial light modulator (SLM) imaging units arranged in arrays, which processes mask data to write partitioned patterns in parallel, allowing for simultaneous exposure across larger substrate areas with lower powered LED and diode laser illumination sources, reducing the need for high-powered illumination and enabling more efficient and cost-effective mask production.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If conventional projection stepper and scanner systems are used for FPD lithography, then mask patterns can be projected to substrate, but the physical mask size must be increased for larger substrates which increases cost and delivery time
Solution Approach 1:
The patent divides the mask data into multiple segments that can be processed by multiple SLM imaging units working in parallel. Instead of requiring a single large physical mask, the mask pattern is segmented and written sequentially to the substrate using multiple smaller SLM units, each handling a portion of the overall pattern.
Solution Approach 2:
The patent uses SLM (spatial light modulator) technology to create programmable digital masks that can be electronically copied and reused indefinitely. This replaces physical masks that must be manufactured anew for each substrate size, allowing the same digital mask data to be applied to substrates of various sizes without additional manufacturing cost.
2Productivity
If high-powered illumination sources are used to expose large substrate areas, then throughput is maintained, but system complexity and cost increase
Solution Approach 1:
The patent combines multiple lower-powered illumination sources, each associated with an SLM imaging unit, to collectively illuminate and expose large substrate areas. Instead of relying on a single high-powered source, the system merges the output of multiple moderate-power sources working in parallel, achieving the same total illumination effect with reduced complexity and cost.
Solution Approach 2:
The patent transitions from a single-point high-power illumination approach to a distributed multi-point illumination approach across the substrate plane. By spreading illumination across multiple spatial locations simultaneously through parallel SLM units, the system achieves area exposure without requiring extreme power concentration at any single point.
3Manufacturing precision
If physical masks are used for lithography, then pattern transfer is achieved, but mask size limitations restrict flexible display production
Solution Approach 1:
The patent employs dynamic, programmable SLM masks that can be electronically reconfigured for different pattern sizes and geometries. Unlike static physical masks that are fixed in size and design, the digital masks can be dynamically adjusted via software to accommodate various substrate dimensions and display configurations, enabling flexible display manufacturing.
Solution Approach 2:
The patent changes the fundamental parameter of mask physical dimensions by transitioning from fixed-size physical masks to variable-size digital masks. The mask data can be scaled and adjusted in software to match any substrate size requirement, removing the physical constraints that previously limited display flexibility and adaptability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach significantly reduces the cost and time required for mask production, enhances throughput, and improves the process window and yield in FPD manufacturing by enabling the production of larger substrates with better CD uniformity and reduced defects, while eliminating the size limitations imposed by physical masks.
Implementation Method 1
A parallel imaging writer system utilizing multiple spatial light modulator (SLM) imaging units arranged in arrays, which processes mask data to write partitioned patterns in parallel
Implementation Method 2
allowing for simultaneous exposure across larger substrate areas with lower powered LED and diode laser illumination sources
Implementation Method 3
lower powered LED and diode laser illumination sources
Implementation Method 4
simultaneous exposure across larger substrate areas
Data Source
AI summary
System and method for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, the method includes providing a parallel imaging writer system which has a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel arrays, receiving a mask data pattern to be written to a substrate, processing the mask data pattern to form a plurality of partitioned mask data patterns corresponding to different areas of the substrate, identifying one or more objects in an area of the substrate to be imaged by corresponding SLMs, and controlling the plurality of SLMs to write the plurality of partitioned mask data patterns in parallel by performing multiple exposures to image the one or more objects in the area of the substrate.