Parallel Substrate Processing Blocks for Throughput
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Solution Overview
Problem
Conventional substrate processing apparatuses face complexity and reduced throughput due to increased substrate transportation processes, especially when additional cleaning units for outer peripheral surfaces are introduced, leading to inefficient handling and processing of substrates.
Innovation Solution
The apparatus is designed with separate processing regions and transport devices that allow concurrent transportation and processing, including reversing mechanisms to efficiently handle substrates between cleaning units, reducing the number of transportation steps and enhancing throughput.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If an end surface cleaning unit is added to perform cleaning processing on the outer peripheral surface of the substrate, then the cleaning capability is improved, but the operation of the center robot becomes even more complicated and throughput is significantly decreased
Solution Approach 1:
The processing section is divided into a first processing section with a first transport device and a second processing section with a second transport device. This segmentation allows substrates to be transported and processed in parallel through different paths, reducing the operational complexity of a single center robot while maintaining enhanced cleaning capabilities across multiple processing sections.
Solution Approach 2:
The patent introduces a first transport device and a second transport device operating in different spatial dimensions and pathways. The first transport device operates in the first processing section while the second transport device operates in the second processing section, creating parallel transport paths that reduce congestion and improve throughput when multiple cleaning units are present.
2Adaptability or versatility
If multiple processing units are arranged around a single center robot, then the processing functionality is improved, but the number of transporting processes increases and operation becomes complicated
Solution Approach 1:
The system is segmented into a first processing section with its own transport device and a second processing section with its own transport device. This segmentation distributes the transportation tasks across multiple specialized devices rather than concentrating all transport operations on a single center robot, thereby reducing operational complexity while maintaining comprehensive processing functionality.
Solution Approach 2:
The first transport device and second transport device are designed to perform multiple functions within their respective processing sections. Each transport device can handle substrate transport, coordinate with multiple processing units, and interface with reversing devices, creating universal transport solutions that reduce overall system complexity despite increased processing capabilities.
3Device complexity
If a single center robot transports substrates through multiple processing units, then the system structure is simplified, but the transport time increases and productivity decreases
Solution Approach 1:
The transportation system is segmented into a first transport device for the first processing section and a second transport device for the second processing section. This segmentation enables parallel substrate transport operations, where substrates can move simultaneously through different processing paths, significantly reducing total transport time while maintaining a manageable system structure through modular design.
Solution Approach 2:
The first transport device and second transport device operate continuously and concurrently to transport substrates through their respective processing sections. This continuous parallel operation eliminates idle time and waiting periods that would occur with a single sequential robot, ensuring that useful transport action is maintained throughout the system at all times.
Data Source
AI summary
A substrate processing apparatus is composed of an indexer block, a first processing block and a second processing block that are provided in parallel with one another. The indexer block is provided with an indexer robot. The first processing block is provided with a plurality of back surface cleaning units and a first main robot. The second processing block is provided with a plurality of end surface cleaning units, a plurality of top surface cleaning units and a second main robot.


