Parallel Template Imprint Lithography Throughput

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Solution Overview

Problem

Current lithographic techniques face limitations in achieving high resolution and throughput due to diffraction barriers, complex optics, and high costs associated with short wavelength radiation, as well as mechanical deformation and temperature differentials in imprint lithography processes.

Innovation Solution

The use of multiple templates operating in parallel to imprint a significant area of a substrate simultaneously, with controlled displacement and orientation to form multiple imprints in an imprintable medium, allowing for efficient patterning and etching of the substrate.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If multiple templates are used to imprint multiple regions simultaneously, then throughput is improved, but device complexity increases

Engineering Contradiction:
ImprovethroughputVSAvoiddevice complexity
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The substrate surface is divided into multiple spaced target regions, with each region imprinted by a separate template. This segmentation allows parallel processing of multiple regions simultaneously, increasing throughput while managing complexity through modular template design

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Multiple templates operate in parallel on the same substrate, combining their individual imprinting actions to achieve comprehensive coverage of multiple target regions in a single processing cycle, thereby multiplying productivity without requiring sequential operations

Inventive Principle:
Principle #5Merging (Combining)

2Manufacturing precision

If templates are displaced to imprint multiple spaced regions, then manufacturing precision is improved, but device complexity increases

Engineering Contradiction:
Improvepattern resolutionVSAvoidtemplate displacement control
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The templates are made movable relative to the substrate, allowing dynamic positioning and displacement between different target regions. This enables precise patterning across multiple areas while maintaining control over template positions through mechanical or actuation systems

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

Template displacement occurs in spatial dimensions across the substrate surface, allowing templates to access different target regions by moving in controlled directions. This dimensional approach to template positioning enables comprehensive coverage while maintaining precision through geometric relationships

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Data Source

PatentUS7676088B2Imprint lithography
Publication Date: 2010.03.09 ASML NETHERLANDS BV
  • US7676088B2 patent drawing
  • US7676088B2 patent drawing
  • US7676088B2 patent drawing

AI summary

An imprinting method is disclosed that, in embodiment, includes contacting first and second spaced target regions of an imprintable medium on a substrate with first and second templates respectively to form respective first and second imprints in the medium and separating the first and second templates from the imprinted medium.