Parallel Vaporization Gas Supply System for High Flow Rate Control
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Solution Overview
Problem
Current gas supply systems using pressure-type flow rate control devices face challenges in achieving large flow rates for gases like HCDS and organometallic gases, particularly due to the need for high temperature maintenance and the limitations imposed by restriction parts, which restrict flow rates to around 1 SLM and require high gas generation capabilities.
Innovation Solution
A gas supply system comprising multiple vaporization supply devices connected in parallel, with each device having a vaporization section, valve, and supply pressure sensor, where the control circuit coordinates the opening and closing of valves to shift the timing of gas flow into a common path, allowing continuous supply of gas at a larger flow rate without relying on restriction parts.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a pressure-type flow rate control device with a restriction part is used, then flow rate control precision is improved, but the maximum flow rate is limited to around 1 SLM
Solution Approach 1:
The system divides the gas supply into multiple parallel channels, each with its own vaporization supply device and flow rate control device. By segmenting the total flow into multiple streams that are subsequently combined, the system achieves both precise control of individual streams and high total flow rate, overcoming the limitation of single-channel restriction parts.
2Productivity
If a single vaporization supply device operates continuously at high temperature, then gas generation capability is improved, but system complexity and temperature control difficulty increase
Solution Approach 1:
The system employs periodic operation where vaporization supply devices alternate between active gas generation phases and idle phases. Multiple devices take turns supplying gas, allowing each device to be heated to operating temperature only when needed, rather than maintaining continuous high temperature. This reduces overall energy consumption and simplifies thermal management while maintaining high total gas generation capability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables continuous supply of gas at a relatively large flow rate, overcoming the limitations of traditional systems by ensuring stable and high-temperature gas delivery, such as 2 SLM or more, without the need for restriction parts.
Implementation Method 1
a liquid raw material of HCDS or an organometallic material is sent by pressure from a raw material tank to a vaporization section and heated by a heater in the vaporization section
Data Source
AI summary
A gas supply system 100 comprises: a first vaporization supply device 10A including a first vaporization section 12A having a heater, a first valve 14A, and a first supply pressure sensor 16A for measuring a gas pressure between the first vaporization section and the first valve; a second vaporization supply device 10B including a second vaporization section 12B having a heater, a second valve 14B, and a second supply pressure sensor 16B for measuring a gas pressure between the second vaporization section and the second valve; and a control circuit 20. The system is configured to flow a gas from the first vaporization section 10A and a gas from the second vaporization section 10B sequentially into a common flow path, by shifting timings of an opening period of the first valve 14A and an opening period of the second valve 14B.