Partial Field Imprint Control via Calibration Data

Solution Overview

Problem

Nanoimprint lithography systems face challenges in achieving precise control over the initial contact point (ICP) for small partial fields, leading to higher defectivity and processing time.

Innovation Solution

A method to determine a set of initial contact control values based on calibration data, desired initial contact points, and partial field shape descriptions, which includes template cavity pressure, substrate pressure, and template tilt, to accurately imprint small partial fields.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If traditional nanoimprint lithography is used for small partial fields, then the process can be performed, but defectivity increases and processing time increases

Engineering Contradiction:

Improveinitial contact point control precisionVSAvoidprocessing time

Core Design Contradiction:

Manufacturing precisionVSProductivity

Solution Approach 1:

The patent applies preliminary action by performing calibration measurements and establishing calibration data before the actual imprinting process. The system measures the relationship between control values (template cavity pressure, substrate pressure, template tilt) and initial contact points during calibration, then uses this pre-acquired data to determine optimal control values for subsequent imprinting operations, thereby achieving precise ICP control without time-consuming real-time experimentation

Inventive Principle:

Principle #10Preliminary action

Solution Approach 2:

The patent implements feedback by using measured initial contact points from calibration data to iteratively determine and refine control values for imprinting. The system compares the actual measured ICP with the desired ICP and adjusts control values accordingly, creating a closed-loop control system that continuously optimizes the imprinting process based on actual performance data

Inventive Principle:

Principle #23Feedback

2Manufacturing precision

If traditional nanoimprint lithography is used for small partial fields, then the process can be performed, but defectivity increases

Engineering Contradiction:

Improveinitial contact point control precisionVSAvoiddefectivity

Core Design Contradiction:

Manufacturing precisionVSReliability

Solution Approach 1:

The patent applies preliminary action by performing calibration measurements and establishing calibration data before the actual imprinting process. The system measures the relationship between control values (template cavity pressure, substrate pressure, template tilt) and initial contact points during calibration, then uses this pre-acquired data to determine optimal control values for subsequent imprinting operations, thereby achieving precise ICP control without time-consuming real-time experimentation

Inventive Principle:

Principle #10Preliminary action

Solution Approach 2:

The patent implements feedback by using measured initial contact points from calibration data to iteratively determine and refine control values for imprinting. The system compares the actual measured ICP with the desired ICP and adjusts control values accordingly, creating a closed-loop control system that continuously optimizes the imprinting process based on actual performance data

Inventive Principle:

Principle #23Feedback

3Manufacturing precision

If extensive experimentation is performed to determine initial contact control values, then manufacturing precision improves, but processing time increases

Engineering Contradiction:

Improveinitial contact control precisionVSAvoidprocessing time

Core Design Contradiction:

Manufacturing precisionVSLoss of time

Solution Approach 1:

The patent applies preliminary action by performing calibration measurements and establishing calibration data before the actual imprinting process. The system measures the relationship between control values (template cavity pressure, substrate pressure, template tilt) and initial contact points during calibration, then uses this pre-acquired data to determine optimal control values for subsequent imprinting operations, thereby achieving precise ICP control without time-consuming real-time experimentation

Inventive Principle:

Principle #10Preliminary action

Solution Approach 2:

The patent uses copying by creating a digital model or lookup table from calibration data that represents the relationship between control values and initial contact points. This digital copy allows the system to quickly determine optimal control values for new imprinting operations without physically re-testing each scenario, thereby maintaining high precision while significantly reducing the time required for process setup

Inventive Principle:

Principle #26Copying

Data Source

PatentUS12235587B2Method and system for determining initial contact control values for shaping partial fields and method and system for shaping partial fields

Publication Date: 2025.02.25 CANON KK

AI summary

A system and method for shaping a film on a partial field which may include determining a set of initial contact control values based on: a superset of calibration data; a desired initial contact point; and a partial field shape description. The system and Method may also include imprinting the partial field with the set of initial contact control values.