Particle Beam Aperture Switching via Magnetic Deflection
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Solution Overview
Problem
Scanning electron microscopes face a trade-off between throughput and resolution due to the limitations of beam current and aperture size, requiring multiple machines for different examination needs, which is inefficient and costly.
Innovation Solution
A particle beam system with a controller, particle emitter, and multiple apertures that allow for adjustable beam current by deflecting particles through a magnetic or electric dipole field, enabling switching between modes to alter beam current without replacing anode stops.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the beam current is increased to improve throughput, then the throughput increases, but the beam focus diameter increases and resolution deteriorates
Solution Approach 1:
The anode stop is divided into multiple segments with different aperture sizes (first aperture, second aperture, etc.). Each aperture can be independently selected to control the beam current, allowing the system to switch between different beam current levels without replacing the entire anode stop, thus resolving the contradiction between throughput and resolution.
Solution Approach 2:
The system introduces a deflector that can dynamically change the trajectory of the particle beam. By adjusting the deflector's magnetic or electric field, the beam can be directed through different apertures of the anode stop, enabling real-time switching between different beam current levels and resolving the static limitation of fixed aperture systems.
2Quantity of substance
If the aperture cross-sectional area is increased to allow higher beam current, then the maximum beam current increases, but the device complexity increases due to the need for multiple anode stops
Solution Approach 1:
Multiple apertures of different sizes are integrated into a single anode stop component. This merging of multiple aperture functions into one component eliminates the need for physical replacement of anode stops, reducing device complexity while maintaining the capability to support different beam current levels.
Solution Approach 2:
A deflector is introduced as an intermediary component between the particle source and the anode stop. The deflector uses magnetic or electric fields to guide the beam through different apertures, providing a non-mechanical means to switch between different beam current levels without physical intervention, thus reducing device complexity.
3Adaptability or versatility
If anode stops with different aperture sizes are used to change beam current, then the beam current can be adjusted, but the operation time increases due to the need to interchange anode stops
Solution Approach 1:
The system transitions from a static configuration requiring physical anode stop replacement to a dynamic system where a deflector can electronically switch the beam path between different apertures. This dynamic control eliminates the time-consuming mechanical interchange operation while maintaining adaptability in beam current adjustment.
Solution Approach 2:
The mechanical system of physically interchanging anode stops is replaced by an electromagnetic system using a deflector. The deflector uses magnetic or electric fields to control the beam trajectory, substituting mechanical operation with field-based control, thereby eliminating the time loss associated with mechanical replacement while preserving the ability to adjust beam current.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables simple and efficient adjustment of beam current, improving throughput or resolution without the need for multiple microscopes, enhancing operational flexibility and reducing maintenance costs.
Implementation Method 1
The first deflector is configured to deflect the first beam and the second beam through a common aperture in the second plate by way of a magnetic or electric dipole field
Implementation Method 2
The first deflector is configured to deflect the first beam and the second beam through a common aperture in the second plate by way of a magnetic or electric dipole field
Data Source
AI summary
A particle source for producing a particle beam includes a particle emitter, a first plate, a first deflector and a second plate with an aperture. The first plate has a smaller aperture, downstream of which a first beam is formed, and a larger aperture, downstream of which a second beam is formed. A controller sets the deflection angle of the deflector so that in a first mode of operation that particles of the first beam pass through the aperture in the second plate and form the particle beam produced by the particle source. The controller sets the deflection angle so that in a second mode of operation that particles of the second beam pass through the aperture in the second plate and form the particle beam produced by the particle source.