Particle Beam Blanker Circuit for Rapid Switching
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Solution Overview
Problem
Conventional particle beam systems do not provide desired operating characteristics immediately after switching on and require a significant time period for stabilization due to changes in the high voltage source voltage during switch activation and capacitor discharging.
Innovation Solution
A particle beam system with a control circuit that includes symmetric current paths for discharging and charging the capacitor formed by deflection plates, using resistors to critically dampen the oscillating circuit and maintain stability, allowing rapid switching on and off of the particle beam without affecting the high voltage source.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Speed
If a conventional beam blanker with a single switch and capacitor is used to switch the particle beam on and off, then the beam can be selectively deflected, but the high voltage source voltage changes during switch activation and capacitor discharging, causing the system to require a long stabilization period before achieving desired operating characteristics
Solution Approach 1:
The patent applies asymmetry by using different resistance values in the two discharge paths (first resistance in the first discharge path, second resistance in the second discharge path). This asymmetric configuration allows independent optimization of each path's discharge characteristics, enabling rapid beam switching while maintaining high voltage source stability through balanced current distribution.
Solution Approach 2:
The patent segments the single discharge path into two separate discharge paths with independent switches and resistors. This segmentation allows the capacitor to discharge through multiple parallel paths simultaneously, reducing the overall discharge time constant while distributing the current load to minimize voltage fluctuations in the high voltage source.
2Loss of time
If the capacitor discharges quickly through a low resistance path to enable rapid beam switching, then the switching response time improves, but the current surge affects the high voltage source stability and causes oscillations
Solution Approach 1:
The patent implements dynamic control by using two independently controllable switches that can be activated at different times and with different timing characteristics. This dynamic switching strategy allows optimization of the discharge profile to achieve rapid stabilization while maintaining reliability through controlled current distribution.
Solution Approach 2:
The resistors in the discharge paths act as intermediary elements that mediate between the capacitor and the high voltage source. These resistors limit the current surge during discharge, preventing direct current shocks to the high voltage source while still enabling sufficiently rapid discharge to achieve quick beam switching and stabilization.
3Ease of operation
If a single discharge path with one switch is used in the beam blanker, then the device complexity is low, but the switching response time is insufficient to provide immediate beam availability after switching on
Solution Approach 1:
The patent merges two discharge paths with their respective switches and resistors into a unified control circuit architecture. This merging allows the system to achieve rapid switching response through parallel discharge while maintaining relatively simple overall circuit design and control logic, as both paths share common circuit elements and control signals.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables immediate and stable operation of the particle beam system after switching on, ensuring desired properties are achieved quickly and consistently, without affecting the high voltage source stability.
Implementation Method 1
the capacitor must be discharged, so that the two deflection plates are at the same electric potential
Implementation Method 2
the control circuit provides a first current path between a first deflection plate of the pair and a second deflection plate of the pair
Implementation Method 3
using resistors to critically dampen the oscillating circuit and maintain stability
Implementation Method 4
a high voltage source for providing an acceleration voltage, in order to accelerate the charged particles of the particle beam that are generated by the particle beam source to a desired kinetic energy
Implementation Method 5
an electric field is produced between the two deflection plates. Such electric field deflects the particle beam
Data Source
Figure 1
Figure 2
Figure 3~4
AI summary
A particle beam system includes a particle beam source for generating a particle beam, a high voltage source, a beam blanker system with deflection plates 56, 57, and a control circuit. The control circuit provides a first current path 67 between the two deflection plates, wherein a switch 70, a node 72 connected to the high voltage source and a switch 76 are arranged in this order in the first current path starting from the deflection plate 56. The control circuit provides a second current path 85 between the deflection plate 56 and the deflection plate 57, wherein in the second current path, starting from the deflection plate 56, a series connection 88 comprising a voltage source 91 a switch 90, a node 86 connected to the high voltage source and a series connection 92 comprising a voltage source 95 and a switch 94 are arranged in this order.