Particle Beam Deflection Device with Axial Magnetic Field
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing particle beam deflection devices in lithography systems face challenges with beam migration due to complex control requirements and limited installation space, leading to unintended exposure of areas during particle beam deflection.
Innovation Solution
A device with a specific arrangement of deflection elements and a magnetic field aligned parallel to the beam axis, allowing for precise control of the virtual pivot point to prevent beam migration, using a single voltage supply unit and adjustable magnetic field for orientation, ensuring accurate deflection without unintended exposure.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If multiple pairs of deflection plates are arranged between condenser lens and objective lens to deflect particle beam, then beam deflection capability is improved, but beam migration occurs due to control complexity and imprecise positioning
Solution Approach 1:
The patent combines multiple deflection plate pairs into a single integrated deflection device with a common control electrode. This merging approach maintains the beam deflection capability while eliminating the coordination complexity between separate plate pairs, thereby preventing beam migration and improving position accuracy.
Solution Approach 2:
The deflection device is segmented into multiple independent deflection plate pairs arranged in sequence, each pair handling a specific deflection task. This segmentation allows precise control of each segment while maintaining overall beam deflection capability, resolving the contradiction between versatility and precision.
2Manufacturing precision
If rapid control of deflection plate pairs is implemented to prevent beam migration, then beam position stability is improved, but control complexity increases due to transit times in control electronics
Solution Approach 1:
By merging multiple deflection plate pairs into a single controlled unit with a common electrode, the patent reduces the number of independent control signals needed. This simplification maintains beam position stability while significantly reducing control system complexity and eliminating coordination issues between multiple plate pairs.
3Manufacturing precision
If precise arrangement of deflection plate pairs is achieved to eliminate beam migration, then beam position accuracy is improved, but installation effort and complexity increase significantly
Solution Approach 1:
The patent merges multiple deflection plate pairs into an integrated structure with a common control electrode, reducing the number of precision positioning requirements. This approach maintains high beam position accuracy while significantly reducing installation effort and complexity compared to coordinating multiple separate plate pairs.
4Volume of stationary object
If limited installation space is available in particle beam device, then device compactness is improved, but arrangement of multiple deflection plate pairs becomes difficult
Solution Approach 1:
The patent arranges multiple deflection plate pairs in a nested or cascaded configuration between the condenser lens and objective lens, allowing each pair to be positioned in sequence along the beam path. This nesting approach enables comprehensive beam deflection capability while maintaining device compactness and fitting within limited installation space.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively prevents beam migration, allowing the particle beam to remain stationary within a few nanometers during deflection, ensuring precise control and minimizing unintended exposure, particularly beneficial for processing small structures in lithography.
Implementation Method 1
at least one magnetic device for providing a magnetic field, wherein the magnetic field is aligned parallel to the beam axis
Implementation Method 2
This known deflection unit is plate-shaped and combines magnetic deflection with electrostatic deflection
Data Source
Figure 1
Figure 2
Figure 3
AI summary
The invention relates to a device (100) for deflecting a particle beam (2) out of a beam axis (8), or for guiding a particle beam (2) into the beam axis (8). Furthermore, the invention relates to a particle beam unit (100) having a device of this type. It is the object of the invention to specify a device for a particle beam unit of this type, which has a simple design, requires little space, and additionally ensures that no area of an object (3) that is not to be struck is struck by a particle beam (2). According to the invention, a configuration having the following sequence along the beam axis (8) is selected: first deflection element (11a, 11b) - a magnetic apparatus (12) for providing a magnetic field (B) axially to the beam axis (8) - a second deflection element (16a, 16b).