Particle Beam Writing Dose Correction for Line Width Precision
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Solution Overview
Problem
Current particle beam writing methods for mask manufacturing face challenges in achieving high throughput and yield due to dose deviations and resist heating effects, leading to line width aberrations and reduced efficiency.
Innovation Solution
A method that adjusts the shot time and current intensity of the particle beam to compensate for dose variations by calculating a correction dose and shot time offset based on contrast curves and nominal current density, ensuring consistent exposure and improved resist pattern quality.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the particle beam exposure dose is increased to improve throughput, then productivity increases, but dose deviations and resist heating effects worsen leading to line width aberrations
Solution Approach 1:
The patent applies preliminary action by pre-calculating correction doses and shot time offsets based on contrast curves and nominal current density before actual exposure. This allows the system to compensate for dose deviations and resist heating effects in advance, enabling higher throughput while maintaining line width precision through pre-planned parameter adjustments.
Solution Approach 2:
The patent implements parameter changes by dynamically adjusting shot time and current intensity based on calculated correction values. The system modifies exposure parameters (dose, shot time, current density) to compensate for resist heating effects and dose variations, allowing increased throughput without sacrificing manufacturing precision.
2Productivity
If the shot time is reduced to increase throughput, then productivity improves, but dose accuracy deteriorates causing line width aberrations
Solution Approach 1:
The patent applies parameter changes by calculating and applying shot time offsets that compensate for dose inaccuracies. Even when shot times are reduced to increase throughput, the system adjusts current intensity and applies correction doses to maintain dose accuracy and prevent line width aberrations.
Solution Approach 2:
The patent implements feedback mechanisms by using contrast curves to determine correction doses and shot time offsets. The system continuously references these pre-established relationships to adjust exposure parameters, ensuring dose accuracy is maintained even during high-speed operation with reduced shot times.
3Productivity
If the current intensity is increased to improve throughput, then productivity increases, but resist heating effects worsen causing dose variations
Solution Approach 1:
The patent applies parameter changes by adjusting current intensity dynamically based on calculated correction values. The system modifies current density parameters to compensate for resist heating effects, allowing increased throughput while maintaining temperature control and dose consistency through real-time parameter optimization.
Solution Approach 2:
The patent implements preliminary anti-action by pre-calculating correction doses that counteract resist heating effects before they occur. The system applies compensatory doses based on pre-determined relationships from contrast curves, preventing temperature-related dose variations even when current intensity is increased for higher throughput.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances the throughput and yield of particle beam writing by accurately compensating for dose deviations and resist heating effects, resulting in improved line width precision and resist pattern quality.
Implementation Method 1
The resist is sensitive to an irradiation with the particles and changes its chemical properties
Implementation Method 2
resist heating effects
Data Source
AI summary
A first exposure dose for a shot area based upon layout data is determined. A correction dose compensating a dose deviation between a first point in time, at which a control unit configured to control a shot time period of a particle beam writing apparatus considers a charged particle beam as having reached a nominal current density, and a second point in time, at which the charged particle beam has actually reached a nominal current density, at a target substrate is determined.