Particle Beam Device Dual Column Control
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Solution Overview
Problem
Existing particle beam devices with both electron and ion beam columns face challenges in achieving optimal image quality due to limitations in controlling and adjusting control parameters, leading to suboptimal image resolution, contrast, and signal-to-noise ratio, especially when dealing with varying sample materials and topographies.
Innovation Solution
A method and system that utilize a particle beam device with two beam columns, where the second particle beam column generates secondary electrons by interacting with the object, allowing for adjustment of control parameters to optimize image quality through specific magnetic and electrostatic field settings, and storage of parameter values based on object properties for future imaging.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If the first particle beam column is used to provide a first particle beam for imaging, then imaging capability is achieved, but the beam parameters cannot be optimized for secondary electron detection from the second particle beam column
Solution Approach 1:
The first particle beam column is designed to serve multiple functions: it can provide a first particle beam for direct imaging and can also serve as a detection system for secondary electrons generated by the second particle beam column. This multi-functionality allows the system to optimize for secondary electron detection while maintaining imaging capability, resolving the contradiction between measurement precision and adaptability.
2Measurement precision
If the second particle beam column interacts with the object to generate secondary electrons, then image resolution and contrast are improved, but controlling the angular range of secondary electrons to reach the detector becomes difficult
Solution Approach 1:
The system employs adjustable control parameters including magnetic field strength, electrostatic field strength, and lens excitations that can be modified to control the angular range of secondary electrons. By changing these parameters, the system optimizes the collection of secondary electrons within a desired angular range while maintaining high image resolution and contrast.
3Measurement precision
If multiple control parameters are adjusted to optimize secondary electron detection, then image quality improves, but the complexity of the control system increases
Solution Approach 1:
The control system merges multiple control functions into a unified system that simultaneously manages magnetic field generation, electrostatic field generation, and lens excitations. This integration allows for coordinated adjustment of multiple parameters to optimize secondary electron detection while managing system complexity through centralized control.
4Measurement precision
If the first particle beam is removed or reduced before introducing the second particle beam, then secondary electron detection is enhanced, but the imaging function of the first beam column is lost
Solution Approach 1:
The system operates in periodic cycles where the first particle beam is removed or reduced during secondary electron detection phases, and then restored for imaging phases. This periodic switching allows the system to alternately optimize for secondary electron detection and imaging functions, maintaining both capabilities without permanent loss of either function.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system enables the generation of images with improved quality by ensuring sufficient secondary electrons reach the detector from a desired angular range, enhancing image resolution, contrast, and signal-to-noise ratio, even with diverse sample characteristics.
Implementation Method 1
at least one magnetic or electrostatic field for guiding second interaction particles into the first objective lens
Implementation Method 2
at least one magnetic or electrostatic field for guiding second interaction particles into the first objective lens
Implementation Method 3
a first beam generator for generating the first particle beam with first charged particles
Implementation Method 4
a second beam generator for generating the second particle beam with second charged particles
Data Source
AI summary
A particle beam device comprises a first particle beam column for providing a first particle beam and a second particle beam column for providing a second particle beam. Operating the particle beam device may include: supplying the second particle beam with second charged particles onto an object using the second particle beam column, loading a value of a control parameter into a control unit from a database or calculating the value of the control parameter in the control unit, setting an objective lens excitation of a first objective lens of the first particle beam column using the value of the control parameter, detecting second interaction particles using a particle detector. The second interaction particles may emerge from an interaction of the second particle beam with the object when the second particle beam is incident on the object.