Particle Beam Etching for Smooth Material Surfaces

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Solution Overview

Problem

Current methods for processing material-specimens, such as ion beam etching and laser beam processing, are inefficient in generating smooth surface regions with small surface roughness, as they either remove material slowly or produce surfaces with significant roughness.

Innovation Solution

A method involving particle beam etching, where the material-specimen is oriented relative to the particle beam column at specific angles to achieve gracing incidence for initial surface smoothing, followed by non-gracing incidence for uniform material removal, ensuring the generation of smooth surface regions with controlled particle dose distribution.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If ion beam etching is used to remove material, then manufacturing precision of surface smoothness is improved, but productivity is worsened due to slow material removal rate

Engineering Contradiction:
Improvesurface smoothnessVSAvoidmaterial removal rate
Core Design Contradiction:
Manufacturing precisionVSProductivity

Solution Approach 1:

The material removal process is divided into two distinct stages: a first stage using ion beam etching at grazing incidence angles (80°-90°) to create an initial smooth surface, and a second stage using the same ion beam at non-grazing angles (0°-60°) to remove additional material. This segmentation allows each stage to optimize for its specific function, resolving the contradiction between smoothness and removal rate

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The invention changes the beam incidence angle parameter dynamically between two stages. In the first stage, the angle is set to 80°-90° (grazing incidence) to maximize surface smoothing. In the second stage, the angle is reduced to 0°-60° (non-grazing incidence) to increase material removal efficiency. This parameter change enables the system to achieve both high smoothness and high productivity

Inventive Principle:
Principle #35Parameter changes

2Productivity

If laser beam processing is used to remove material quickly, then productivity is improved, but manufacturing precision of surface smoothness is worsened

Engineering Contradiction:
Improvematerial removal rateVSAvoidsurface smoothness
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The ion beam etching at grazing incidence is performed as a preliminary action before the main material removal stage. This preliminary smoothing creates a foundation surface that enables subsequent high-rate removal while maintaining overall surface quality, effectively preparing the material for the productivity-focused second stage

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This method efficiently generates smooth surface regions with significantly reduced roughness, allowing for precise exposure of embedded structures for analysis, while maintaining the ability to remove material quickly and cost-effectively.

Implementation Method 1

generating a substantially smooth, first surface region (21) of the material-specimen by removing a first material-volume (I) from the material-specimen by particle beam etching using a particle beam (17) generated by the particle beam column

Methodology Applied
Scientific EffectParticle beam etching: Ion Beam

Data Source

PatentEP2743026B1Method of processing a material-specimen
Publication Date: 2021.08.25 CARL ZEISS MICROSCOPY GMBH
  • EP2743026B1 patent drawingFigure 1~2
  • EP2743026B1 patent drawingFigure 3~4
  • EP2743026B1 patent drawingFigure 5~6

AI summary

A method for generating a smooth surface 23 in a material-specimen 1, comprising: generating a substantially smooth, first surface region 21 by removing a first material-volume by particle beam etching, wherein the first material-volume is partially defined by the first surface region and wherein an angle between a beam direction 15 and a surface normal of the first surface region 21 is greater than 80° and smaller than 90°; and generating a substantially smooth, second surface region 23 by removing a second material-volume II, wherein the second material-volume is partially defined by the first surface region 21' and is partially defined by the second surface region 23 and wherein an angle α between the beam direction 15 and a surface normal of the second surface region 23 is smaller than 60°.