Particle Beam Gas Ratio Feedback for Precise Sample Processing

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Solution Overview

Problem

Existing particle beam systems lack the ability to determine whether a process gas processing setting effectively achieves desired processing on a sample, leading to inefficiencies in material deposition or removal.

Innovation Solution

A particle beam system with a controller that adjusts process gas supply and activation settings based on real-time measurements of sample properties, allowing for dynamic modification of gas ratios and processing parameters to achieve desired outcomes.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If process gas supply settings are used to deposit or remove material on a sample, then material deposition or removal is achieved, but it cannot be determined whether the processing setting actually enables desired processing

Engineering Contradiction:
Improveprocessing precisionVSAvoidprocess verification
Core Design Contradiction:
Manufacturing precisionVSLoss of information

Solution Approach 1:

The system introduces a measuring device that detects properties of the processed sample and feeds this information back to the controller. The controller then modifies process gas supply settings based on this feedback, creating a closed-loop control system that verifies whether desired processing is actually achieved and adjusts parameters accordingly to reach target processing outcomes.

Inventive Principle:
Principle #23Feedback

2Adaptability or versatility

If multiple process gases are supplied sequentially to achieve desired processing, then processing flexibility is improved, but processing time increases

Engineering Contradiction:
Improveprocessing flexibilityVSAvoidprocessing time
Core Design Contradiction:
Adaptability or versatilityVSLoss of time

Solution Approach 1:

The system dynamically adjusts process gas supply settings during processing based on real-time measurement feedback. Instead of following fixed sequential gas supply schedules, the controller continuously modifies gas flow rates and timing to optimize processing efficiency while maintaining the ability to achieve desired processing outcomes, thereby reducing overall processing time.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The system changes processing parameters (gas flow rates, supply timing, gas ratios) dynamically during the processing based on measured sample properties. This allows the system to adapt gas supply parameters in real-time to achieve desired processing faster, rather than adhering to predetermined sequential gas supply schedules.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables precise and efficient material deposition or removal on a sample by continuously monitoring and adapting processing settings, ensuring desired results are achieved during the processing.

Implementation Method 1

a first particle beam column (11) which is configured to produce a first particle beam (12) of charged particles... activation in accordance with a process gas activation setting of the supplied, at least one process gas by the first particle beam

Methodology Applied
Scientific EffectIonization: Ionisation

Data Source

PatentUS12512296B2Method of processing a sample, particle beam system, and computer program product
Publication Date: 2025.12.30 CARL ZEISS MICROSCOPY GMBH
  • US12512296B2 patent drawing
  • US12512296B2 patent drawing
  • US12512296B2 patent drawing

AI summary

While the sample is in a vacuum chamber of the particle beam system, a method comprises: processing the sample via an automatic supply in accordance with a process gas supply setting of at least one of a plurality of different process gases to the sample via a process gas supply device and via an activation of the supplied, at least one process gas by a particle beam of charged particles or a laser beam; measuring a property of the processed sample using a measuring device; modifying the process gas supply setting so that there is a change in a ratio of the quantities of the process gases to be supplied, on the basis of a measurement result obtained by the measurement; and continuing the processing of the sample using the modified process gas supply setting.