Particle Beam Scan Path Routing for Charge Deposition Prevention
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional particle beam systems face negative influences such as charge deposition, impurity generation, and structural damage during the return movement of the particle beam, which can affect precision and require costly particle beam blankers for mitigation.
Innovation Solution
A method where the particle beam is moved across an object's surface in sequences with a scan path entirely within a defined region and a return path entirely outside the region, ensuring continuous beam striking without interruption, thereby minimizing negative influences on the object.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the particle beam is moved across the region during return from an end of a line to the beginning of a next line, then the beam can be continuously moved without interruption, but charge is deposited or generated in the object which negatively affects the precision of the beam movement in the next line
Solution Approach 1:
The patent divides the beam path into two distinct segments: a scan path within the region of interest and a return path outside the region. This segmentation allows the beam to be continuously moved while preventing charge deposition in the analysis area during return, thus resolving the contradiction between continuity and precision.
2Object-affected harmful factors
If a particle beam blanker is used to interrupt the particle beam during return, then charge deposition and impurity generation are prevented, but control effort and costs increase significantly
Solution Approach 1:
The patent extracts the harmful return path movement from the region of interest by routing the beam outside the region during return. This eliminates the need for particle beam blankers and their associated control systems, preventing charge deposition while reducing device complexity and costs.
3Object-affected harmful factors
If the particle beam is interrupted by a particle beam blanker during return, then negative influences on the object are prevented, but significant costs are involved
Solution Approach 1:
The patent removes the need for expensive particle beam blankers by extracting the return path from the region of interest and routing it outside. This prevents structural damage and impurity generation while significantly reducing system costs and simplifying the overall system design.
Data Source
AI summary
A method of operating a particle beam microscope includes repeating a sequence to move a particle beam across a surface of an object. The surface of the object has a region defined by a closed boundary line. The sequence includes moving the particle beam from an entry location of the present sequence to an exit location of the present sequence along a scan path. The entry location of the present sequence and the exit location of the present sequence are located on the boundary line. The scan path is located entirely inside the region of the surface of the object. The sequence also includes moving the particle beam from the exit location of the present sequence to an entry location of the next sequence along a return path. The entry location of the next sequence is located on the boundary line. The return path is located entirely outside the region of the surface of the object.