Particle Detection Device for Semiconductor Chemical Solutions
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Solution Overview
Problem
Semiconductor manufacturing processes are hindered by the inability to effectively test chemical solutions for charged or metal particles, which can lead to short circuits and chip failures due to the difficulty in detecting these particles in high-purity solutions.
Innovation Solution
A particle detection device comprising a detection tube, a light emitter, a light receiver, and a processing unit that determines the presence of particles by analyzing the light intensity scattered from the solution, allowing for real-time monitoring and evaluation of chemical solutions before use in high-precision processes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If chemical solutions are used in high-precision semiconductor manufacturing processes, then productivity is improved, but the risk of particle contamination causing short circuits and chip failures increases
Solution Approach 1:
The patent implements preliminary particle detection in chemical solutions before they are used in semiconductor manufacturing processes. The detection device analyzes chemical solutions using light scattering methods to identify particles in advance, allowing contaminated solutions to be filtered or replaced before entering the manufacturing process, thus preventing yield loss while maintaining productivity
2Device complexity
If conventional detection methods are used for chemical solutions, then device complexity is reduced, but measurement precision of particle detection deteriorates
Solution Approach 1:
The patent replaces complex mechanical filtration and visual inspection methods with optical detection using light scattering principles. The system uses a light source to illuminate the chemical solution and detectors to measure scattered light intensity, providing precise particle detection without requiring complex mechanical components or subjective visual assessment
Solution Approach 2:
The patent changes the detection parameter from visual inspection or complex mechanical analysis to light scattering intensity measurement. By measuring the intensity of light scattered by particles in the chemical solution, the system achieves high measurement precision for particle presence and concentration while maintaining relatively simple device architecture
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The device accurately detects the presence and size of particles, preventing the use of contaminated solutions and thereby improving the yield and reliability of semiconductor manufacturing processes by ensuring the quality of chemical solutions.
Implementation Method 1
a light emitter, generating a detection light, and emitting the detection light to the detection solution
Implementation Method 2
If there are particles in the detection solution, the detection light entering the detection solution can be scattered by the particles, and the scattered detection light can be received by the light receiver
Implementation Method 3
a light receiver, receiving the detection light scattered from the detection solution, and generating a detection signal according to the detection light
Data Source
AI summary
A particle detection device includes a detection tube, a light emitter, a light receiver, and a processing unit. The detection tube is for a detection solution to pass through. The light emitter generates a detection light and emits the detection light to the detection solution. The light receiver receives the detection light scattered from the detection solution. The processing unit generates a received light intensity value according to the detection signal generated by the light receiver, and determines whether the received light intensity value is greater than a first threshold value: if greater, generating a detection result of particles; otherwise, generating a detection result of no particles. Then it provides a basis for semiconductor manufacturing companies to evaluate whether the detection solution can be used in a high-precision manufacturing processes, thereby optimizing the manufacturing process and improving the yield rate of the high-precision manufacturing process.