Particle Elimination Unit for Semiconductor Substrate Transfer
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Solution Overview
Problem
During the transfer of semiconductor substrates, particles generated by the substrate transfer mechanism can contaminate the substrates, leading to contamination issues in the fabrication and packaging processes.
Innovation Solution
A particle elimination unit with a housing, partition wall, and pressure generating member that alternately generates positive and negative pressures to open and close gates, allowing particles to be removed from the substrate transfer space to an exterior space, using a system of gates and elastic members to manage airflow and eliminate particles effectively.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a substrate transfer mechanism is used to transfer substrates vertically, then substrate transfer capability is improved, but particles are generated that contaminate the substrates
Solution Approach 1:
The housing is divided into multiple spaces (first space, second space, upper space, lower space) by partition walls, creating isolated zones for particle elimination and substrate transfer operations. This segmentation allows particle removal activities to occur without directly contaminating the substrate transfer area.
Solution Approach 2:
A particle elimination unit is introduced as an intermediary system between the substrate transfer mechanism and the external environment. This unit captures and eliminates particles generated during transfer operations, preventing them from contaminating substrates while allowing the transfer mechanism to continue functioning.
2Object-affected harmful factors
If a particle elimination unit is added to remove particles, then substrate contamination is reduced, but device complexity increases
Solution Approach 1:
A pressure generating member is used to create positive and negative pressure differentials within the particle elimination unit. By alternately generating positive pressure in the upper space and negative pressure in the lower space, the system drives particle-laden air through gates and partition wall openings, achieving effective particle elimination through pneumatic forces without complex mechanical components.
Solution Approach 2:
The pressure generating member operates periodically, alternately switching between generating positive pressure and negative pressure. This periodic pressure variation creates cyclic airflow patterns that continuously draw particles from the substrate transfer area through the partition wall and eliminate them externally, maintaining constant protection without requiring continuous complex mechanical intervention.
3Object-affected harmful factors
If multiple gates are used to control airflow for particle elimination, then particle removal effectiveness is improved, but device complexity increases
Solution Approach 1:
The gates are designed to automatically open and close in response to pressure differentials created by the pressure generating member. When positive pressure is generated in a space, the corresponding gate opens automatically; when negative pressure is generated, the gate closes. This self-service mechanism eliminates the need for external actuators or complex control systems for each gate, reducing overall device complexity while maintaining effective particle elimination.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively reduces substrate contamination by alternately generating pressures to move particles out of the transfer space, ensuring cleaner substrates throughout the manufacturing process.
Implementation Method 1
a pressure generating member dividing the first space into an upper space and a lower space and being movable in a vertical direction in the first space such that a positive pressure and a negative pressure are alternately generated in the upper space and the lower space
Data Source
AI summary
In an apparatus for transferring a substrate, a partition wall is disposed in a vertical direction in a housing to divide an interior space of the housing into a first space and a second space. A pressure generating member divides the first space into an upper space and a lower space and moves in a vertical direction in the first space such that a positive pressure and a negative pressure are alternately generated in the upper space and the lower space. A substrate supporting member is movably disposed in the second space to support and to transfer the substrate. A plurality of gates is disposed on a side wall of the housing and the partition wall, and is opened and closed by the positive pressure and the negative pressure such that the particles are eliminated from the second space to an exterior space via the first space.