Charged Particle Microscopy Drift Correction for EMI Blur

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Solution Overview

Problem

Charged particle beam systems in microscopy face challenges due to electromagnetic interference (EMI) that cause beam shifts and blur images, making accurate imaging and data acquisition difficult, especially in testing nanostructured integrated circuits.

Innovation Solution

A method to localize defects in a sample by generating drift information and correction vectors using charged particle beam systems, which includes coordinating beam imaging with transient electrical signals to correct for beam shifts induced by electromagnetic fields.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If charged particle beam systems are used to image nanostructured integrated circuits, then imaging resolution is improved, but electromagnetic interference from the circuit causes beam shifts and image blurring

Engineering Contradiction:

Improveimaging resolutionVSAvoidbeam shifts and image blurring

Core Design Contradiction:

Measurement precisionVSObject-affected harmful factors

Solution Approach 1:

The system performs preliminary actions by generating drift information and correction vectors before the actual imaging process. The method predicts beam drift caused by electromagnetic interference and applies correction vectors to compensate for these shifts, thereby preventing image blurring while maintaining high resolution imaging capability

Inventive Principle:

Principle #10Preliminary action

Solution Approach 2:

The system implements feedback by continuously monitoring beam position and generating correction vectors based on detected drift. The correction vectors are applied in real-time to counteract electromagnetic interference effects, creating a closed-loop control system that maintains beam stability despite circuit activity

Inventive Principle:

Principle #23Feedback

2Reliability

If periodic test signals are applied to the integrated circuit to examine circuit performance, then circuit functionality is tested, but electromagnetic fields from varying device current steer the electron beam away from the target

Engineering Contradiction:

Improvecircuit performance testingVSAvoidbeam positioning accuracy

Core Design Contradiction:

ReliabilityVSMeasurement precision

Solution Approach 1:

The system generates drift information and correction vectors in advance, before the periodic test signals are applied. This preliminary correction preparation allows the system to anticipate and compensate for beam steering effects caused by varying device current, maintaining accurate beam positioning during circuit performance testing

Inventive Principle:

Principle #10Preliminary action

Solution Approach 2:

The correction vector acts as an intermediary that mediates between the electromagnetic fields generated during circuit testing and the electron beam. By applying these correction vectors, the system counteracts the steering effects of varying device current, allowing both circuit testing and accurate imaging to proceed simultaneously

Inventive Principle:

Principle #24Intermediary (Mediator)

3Device complexity

If beam shifts are not corrected, then the system can operate without additional complexity, but imaging accuracy and defect localization precision are degraded

Engineering Contradiction:

Improvesystem operation simplicityVSAvoiddefect localization accuracy

Core Design Contradiction:

Device complexityVSMeasurement precision

Solution Approach 1:

The system replaces complex mechanical beam stabilization mechanisms with computational methods. Instead of using physical components to mechanically counteract beam shifts, the system uses algorithms to generate drift information and correction vectors, achieving high precision defect localization through software-based compensation rather than hardware complexity

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Improves the accuracy and precision of charged particle microscope images by correcting beam drift artifacts, allowing for precise imaging and data acquisition in the presence of electromagnetic interference.

Implementation Method 1

generating drift information for a drift of the beam of charged particles in one or more directions, the drift being induced at least in part by an electromagnetic field in a vicinity of the sample

Methodology Applied

Scientific EffectElectromagnetic field: Electromagnetic Induction

Data Source

PatentUS20250347640A1Techniques for reducing electromagnetic interference effects in charged particle microscopy

Publication Date: 2025.11.13 FEI CO

AI summary

Embodiments of the present disclosure improve the performance of charged particle beam systems during imaging and/or microanalysis, at least in part by permitting a system and/or user to account for the influence of electromagnetic interference on beam direction and/or shape. Techniques are described for identifying, tracking, and/or correcting electromagnetic interference-induced beam drifts, as well as techniques for localizing defects in integrated circuit devices.