Charged Particle-Optical Module with Macro-Corrector Beam Control
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Solution Overview
Problem
Existing charged-particle apparatuses face challenges in controlling beam characteristics without incurring beam current loss due to sub-beam interactions with lens array plates, which can lead to defects in semiconductor manufacturing and reduce yield and throughput.
Innovation Solution
A charged particle-optical module comprising an electron source, a beam limiter, a condenser lens array, and a macro-corrector system is used to generate and control a plurality of sub-beams, with the macro-corrector system positioned between the beam limiter and the condenser lens array to minimize beam current loss and improve beam control.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If a condenser lens array is used to control sub-beams, then beam control is improved, but beam current loss occurs due to sub-beam interactions with lens array plates
Solution Approach 1:
A macro-corrector system is introduced as an intermediary component between the beam limiter and the condenser lens array. This macro-corrector system corrects beam characteristics before the sub-beams enter the condenser lens array, reducing unwanted interactions with the lens array plates while maintaining effective beam control.
Solution Approach 2:
The macro-corrector system performs preliminary correction of beam characteristics before the sub-beams reach the condenser lens array. By pre-correcting the beams, the system reduces subsequent interactions with the lens array plates that would otherwise cause beam current loss.
2Productivity
If the beam limiter defines an array of apertures to form sub-beams, then beam generation is improved, but beam current loss occurs due to interactions with lens array plates
Solution Approach 1:
The macro-corrector system serves as a mediator between the beam limiter and condenser lens array, correcting beam characteristics after sub-beam formation but before they enter the lens array, thereby preventing beam current loss while maintaining productive beam generation.
Solution Approach 2:
The macro-corrector system performs preliminary correction of beam characteristics before the sub-beams enter the condenser lens array, preventing subsequent beam current loss while preserving the productive beam generation capability of the beam limiter.
3Measurement precision
If sub-beams are projected toward a sample for inspection, then detection capability is improved, but beam current loss reduces yield and throughput
Solution Approach 1:
The macro-corrector system acts as an intermediary that preserves beam current by correcting beam characteristics before they enter the condenser lens array, thereby maintaining both detection capability and productivity (yield and throughput).
Solution Approach 2:
By performing preliminary beam correction before the sub-beams enter the condenser lens array, the macro-corrector system prevents beam current loss that would otherwise reduce yield and throughput, while maintaining the detection capability needed for inspecting micro and nano-scale defects.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enhances the control of beam characteristics, reducing beam current loss and improving the detection and identification of micro and nano-scale defects in semiconductor manufacturing, thereby increasing yield and throughput.
Implementation Method 1
The electron source comprises an emitter configured to emit a source beam along a divergent path
Implementation Method 2
The condenser lens array is configured to operate on the sub-beams. The condenser lens array comprises at least two plates in which are each defined an array of apertures corresponding to the sub-beams
Implementation Method 3
The macro-corrector system is configured to act on the sub-beams. The macro-corrector system is at least partly comprised between the beam limiter and the condenser lens array
Data Source
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AI summary
A charged particle-optical module for generating a plurality of sub-beams 211-213 from a source beam 202 of electrons, the module for use in an charged particle-optical device for projecting a plurality of sub-beams 211-213 toward a sample. The charged particle module comprises: an electron source 201 comprising an emitter 63 configured to emit a source beam 202 along a divergent path; a beam limiter 236 defining an array of apertures 232 and positioned in the divergent path to form a grid of sub-beams from the source beam; a condenser lens array 231 configured to operate on the sub-beams; and a macro-corrector system 60 configured to act on the sub-beams. The macro-corrector system is at least partly comprised between the beam limiter and the condenser lens array.