Particle Pattern Simulation for Seamless Surface Coverings
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Solution Overview
Problem
It is challenging to predict and visualize the particle patterns in seamless surface coverings before installation, as the infinite combinations of particle sizes, geometries, and colors make it difficult to accurately simulate the final appearance without actual application.
Innovation Solution
A computer-based system that receives particle parameters, creates particle elements, and builds patterns using these elements, allowing for real-time simulation of particle patterns on a substrate, including the use of a color sensor to import real-world colors and adjust parameters for accurate representation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If particle patterns are simulated using physical swatches or samples, then a tangible representation is provided, but only a small portion of possible configurations is captured, limiting accuracy
Solution Approach 1:
The patent creates virtual copies of particle patterns through computer-generated simulations that replicate the visual appearance of physical particle arrangements. The system generates digital representations of particles with varying sizes, shapes, and colors, allowing unlimited configuration variations without physical constraints. This virtual copying approach enables comprehensive exploration of particle pattern possibilities while maintaining visual fidelity to actual particle appearances.
Solution Approach 2:
The system enables continuous adjustment of particle parameters including size, shape, color, and distribution patterns through digital controls. Users can modify numerical parameters to generate infinite variations of particle configurations, transitioning smoothly between different pattern designs. This parameter-based control provides precise adjustment capabilities that physical samples cannot match, allowing detailed optimization of particle pattern appearance.
2Adaptability or versatility
If multiple physical samples are created to represent different particle configurations, then more patterns can be visualized, but the process becomes time-consuming and resource-intensive
Solution Approach 1:
Virtual particle pattern simulations replace physical sample creation with digital reproductions that can be generated instantaneously. The system creates multiple particle configuration variations through computer algorithms, eliminating the time required for physical sample preparation, installation, and removal. Users can review numerous pattern options in minutes rather than days, significantly accelerating the design selection process.
Solution Approach 2:
The system performs preliminary visualization of particle patterns before actual installation occurs. By simulating particle arrangements digitally, users can evaluate multiple configurations in advance and select the optimal design prior to committing to physical installation. This preliminary digital assessment prevents unnecessary physical sample creation and installation for patterns that may not be suitable.
3Measurement precision
If particle patterns are simulated with high detail and accuracy, then better visualization is achieved, but computational complexity and resource requirements increase
Solution Approach 1:
The system applies different levels of detail to different regions of the particle pattern simulation. High-detail rendering is concentrated on areas of primary interest or larger surface regions, while peripheral or less critical areas use simplified representations. This localized quality adjustment maintains visual accuracy where needed while reducing overall computational burden and resource requirements.
Solution Approach 2:
The simulation implements sufficient detail to achieve accurate particle pattern visualization without unnecessary excessive computation. The system calculates particle arrangements and visual properties to the degree required for practical design purposes, avoiding overly complex computations that would not contribute meaningfully to the visualization quality. This balanced approach achieves adequate precision with manageable computational resources.
Data Source
AI summary
A method is provided comprising, receiving, by a computer system comprising a processor and a tangible, non-transitory memory, particle parameters, creating, by the computer system, particle elements in accordance with the particle parameters, and building, by the computer system, a pattern using the particle elements.