Particle Shield Gas Injector Extractor Photolithography
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Solution Overview
Problem
In photolithography processes, particles and contaminants introduced into the manufacturing environment degrade the quality of pattern transfer by dispersing light and adhering to surfaces, leading to reduced precision and manufacturing yield.
Innovation Solution
An apparatus generating a particle shield using a combination of gas injectors and extractors, or magnetic fields, to prevent particles from reaching sensitive surfaces and optical paths, thereby maintaining cleanliness and precision in pattern transfer.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If a solid shield is installed on a wafer transportation/storage pad, then particles are blocked from contacting the pad surface, but the shield occupies space and may interfere with wafer handling operations
Solution Approach 1:
The patent uses a gas stream (pneumatic field) instead of a solid shield to protect the wafer surface. Gas injectors create a controlled gas flow that forms a protective barrier, preventing particles from contacting the wafer while occupying minimal space and not interfering with mechanical handling operations.
Solution Approach 2:
The patent replaces the mechanical solid shield with a pneumatic gas stream system. This substitution eliminates the physical obstruction problems of solid shields while maintaining particle protection functionality through the invisible gas barrier.
2Object-affected harmful factors
If gas injectors and extractors are used to form a particle shield, then particles are effectively blocked from surfaces, but the system requires additional components and control mechanisms
Solution Approach 1:
The gas extractors are positioned to utilize the natural upward movement of particles and gas flow, allowing the system to self-regulate particle removal without requiring complex active control mechanisms. The extractors passively capture particles that rise with the gas flow.
Solution Approach 2:
The gas injection system serves multiple functions: it creates the protective particle shield, facilitates particle removal through extractors, and can be integrated with existing wafer handling processes, reducing the need for separate dedicated systems.
3Manufacturing precision
If cleaning solvents are sprayed on surfaces to remove particles, then accumulated particles are removed, but the spraying process adds time and may introduce additional contamination
Solution Approach 1:
The particle shield is formed continuously during wafer processing operations, preventing particle accumulation in the first place. This preliminary protective action eliminates the need for subsequent cleaning cycles, saving time and avoiding potential contamination from cleaning solvents.
Solution Approach 2:
Instead of allowing particles to accumulate and then requiring cleaning to remove them, the system uses the gas flow that could potentially disturb particles to instead create a protective barrier that prevents accumulation, converting a potential harm into a beneficial protective mechanism.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The particle shield effectively prevents contaminants from adhering to surfaces and optical paths, enhancing the precision and yield of photolithography processes by maintaining a clean environment and ensuring accurate pattern transfer.
Implementation Method 1
a gas stream forming mechanism generating a stream over the surface of the wafer to be exposed
Implementation Method 2
An apparatus generating a particle shield using a combination of gas injectors and extractors, or magnetic fields
Data Source
Figure 1A~1B
Figure 1C~1D
Figure 2A~2B
AI summary
An apparatus for generating at least one particle shield in photolithography includes a first component and a second component. The first component and the second component are operable to form a first particle shield of the at least one particle shield for blocking particles from contacting a proximate surface of an object. The first component includes a first gas injector, and the second component includes a first gas extractor corresponding to the first gas injector. The first gas injector is configured to blow out a gas, thereby forming the first particle shield. The first gas extractor is configured to work with the first gas injector for providing gas pressure gradient for the first particle shield.