Partition Wall Gutter for Cleaning Liquid Capture
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Solution Overview
Problem
Cleaning liquids attached to partition walls during substrate transfer can contaminate substrates in substrate processing apparatuses, as they are scattered by centrifugal force and fall onto the substrates.
Innovation Solution
A gutter is fixed to the partition wall between pass holes, with a discharge pipe connected to its bottom, allowing the collection and external discharge of cleaning liquids, preventing them from attaching to substrates.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If the transfer robot changes direction while holding the substrate, then the substrate can be transferred between chambers, but the cleaning liquid attached to the substrate is scattered by centrifugal force and attaches to the partition wall, potentially contaminating subsequent substrates
Solution Approach 1:
An inclined guide is introduced as an intermediary component between the substrate pass hole and the external environment. This guide provides a controlled path for cleaning liquid to flow down under gravity, preventing it from contaminating substrates that pass through the partition wall. The inclined guide mediates between the scattered cleaning liquid and the substrate, directing the liquid harmlessly to the outside.
2Object-affected harmful factors
If an inclined guide is attached to the partition wall to guide cleaning liquid outward, then substrate contamination is prevented, but the cleaning liquid may overflow and fall onto substrates passing through lower pass holes
Solution Approach 1:
A gutter is introduced as an intermediary component to collect and control the flow of cleaning liquid. The gutter receives cleaning liquid from the inclined guide and provides a controlled discharge path through a discharge pipe. This prevents uncontrolled overflow onto substrates while maintaining effective contamination prevention.
Solution Approach 2:
The cleaning liquid discharge path is extended into a third dimension by using a gutter with vertical depth. Instead of allowing liquid to flow freely along the partition wall surface (2D), the gutter confines the liquid flow within a three-dimensional structure, directing it safely to the discharge pipe below the pass holes.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively captures and removes cleaning liquids from the partition wall, preventing substrate contamination during transfer.
Implementation Method 1
A gutter 51 and a discharge pipe 52 are also provided on a partition wall 40. The gutter 51 is disposed above the second pass hole 46, and the other end of the discharge pipe 52 is disposed below the second pass hole 46. The cleaning liquid received by the gutter 51 is discharged to the outside through the discharge pipe 52.
Data Source
AI summary
A cleaning apparatus includes: a cleaning chamber configured to clean a substrate; a transfer chamber positioned adjacent to the cleaning chamber and configured to transfer the substrate; a partition wall partitioning the cleaning chamber and the transfer chamber; a gutter fixed to the partition wall; and a discharge pipe connected to a bottom portion of the gutter. A first pass hole and a second pass hole positioned below the first pass hole are formed in the partition wall. The gutter is positioned between the first pass hole and the second pass hole, and extends from one side end to the other side end of the partition wall.