Partitioned CVD Chamber Layout for Compact Multi-Process Deposition

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Solution Overview

Problem

Existing chemical vapor deposition (CVD) apparatuses are large in size and have low production efficiency due to the vertical arrangement of chambers and the need for separate heating zones.

Innovation Solution

A chemical vapor deposition apparatus with an inner partition wall dividing the reaction chamber into multiple division chambers, sharing a heater, and using baffles to shield openings, which allows for compact design and improved production efficiency and quality.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Adaptability or versatility

If multiple chambers are vertically arranged, then the chemical vapor deposition apparatus can perform multiple deposition processes, but the length or size of the apparatus becomes too large

Engineering Contradiction:

Improvemultiple deposition processesVSAvoidapparatus size

Core Design Contradiction:

Adaptability or versatilityVSLength of stationary object

Solution Approach 1:

The reaction chamber is divided into multiple division chambers using inner partition walls, allowing multiple deposition processes to occur simultaneously in separate zones within a single chamber volume, thereby reducing the overall apparatus length while maintaining multi-process capability

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

Instead of arranging chambers vertically in the height direction, the invention divides the reaction chamber into multiple division chambers in the horizontal direction using partition walls, transitioning from vertical stacking to horizontal segmentation to reduce apparatus length

Inventive Principle:

Principle #17Another dimension (Dimensionality change)

2Adaptability or versatility

If a heating zone is formed for each chamber, then each deposition process can be independently controlled, but production efficiency decreases due to multiple heating zones

Engineering Contradiction:

Improveindependent process controlVSAvoidproduction efficiency

Core Design Contradiction:

Adaptability or versatilityVSProductivity

Solution Approach 1:

Multiple division chambers share a common heater located in the reaction chamber, consolidating the heating function into a single zone that serves all deposition processes simultaneously, thereby improving production efficiency while maintaining independent process control through separate gas supply and partition wall designs

Inventive Principle:

Principle #5Merging (Combining)

3Ease of operation

If the reaction chamber has open top and bottom, then deposition target can be fed through, but temperature non-uniformity occurs affecting deposition quality

Engineering Contradiction:

Improvedeposition target feedingVSAvoiddeposition quality

Core Design Contradiction:

Ease of operationVSManufacturing precision

Solution Approach 1:

Baffles are introduced as intermediary structures at the open top and bottom of the reaction chamber to shield and control gas flow, reducing temperature non-uniformity caused by direct openings while still allowing deposition targets to be fed through the chamber

Inventive Principle:

Principle #24Intermediary (Mediator)

Solution Approach 2:

The baffle structures are positioned specifically at the top and bottom openings where temperature non-uniformity occurs, providing localized temperature control and shielding without affecting the overall open structure needed for target feeding

Inventive Principle:

Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The apparatus achieves a compact design while enhancing production efficiency and reducing temperature non-uniformity, thereby improving the quality of chemical vapor deposition.

Implementation Method 1

a heater disposed at the outer surface of the reaction chamber

Methodology Applied

Scientific EffectHeating: Heating

Implementation Method 2

an inner partition wall disposed in the reaction chamber and for dividing the inner space of the reaction chamber in the height direction to form a plurality of division chambers

Methodology Applied

Scientific EffectPhysical separation: Physical Containment

Implementation Method 3

a baffle for shielding the open top and the open bottom of the reaction chamber

Methodology Applied

Scientific EffectThermal shielding: Thermal Insulation

Implementation Method 4

a plurality of upper winding rolls disposed above the reaction chamber, and at least one roller disposed below the reaction chamber

Methodology Applied

Scientific EffectMechanical transport: Roller

Data Source

PatentUS12577676B2Chemical vapor deposition apparatus

Publication Date: 2026.03.17 LG ELECTRONICS INC

AI summary

Discussed is a chemical vapor deposition apparatus that includes a reaction chamber with an open top and an open bottom, at least one inner partition wall can be in the reaction chamber and can divide an inner space of the reaction chamber in a height direction to form a plurality of division chambers. A heater can be further disposed at an outer surface of the reaction chamber, a plurality of upper winding rolls can be disposed above the reaction chamber, and at least one roller can be disposed below the reaction chamber.