Partitioned Substrate Processing Chamber Pressure Control
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Solution Overview
Problem
Conventional substrate processing apparatuses face challenges in maintaining constant pressure within the chamber due to varying environmental conditions, leading to inefficient pressure control and potential chemical solution deterioration.
Innovation Solution
A substrate processing apparatus with a partitioned chamber, including a processing space for chemical solutions and a separate deionized water processing space, equipped with a pressure adjusting mechanism using gas supply and exhaust controls to maintain predetermined pressure levels, minimizing the controlled region and preventing gas exchange between processing spaces.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the whole chamber is subjected to pressure control, then pressure control coverage is comprehensive, but pressure control efficiency is poor
Solution Approach 1:
The chamber is divided into a processing space and a non-processing space using a partition member. The pressure control system is segmented to control only the processing space, separating the functional regions to improve pressure control efficiency while maintaining comprehensive coverage where needed.
2Adaptability or versatility
If relative pressure control of the chamber is used, then the chamber can adapt to ambient atmosphere, but pressure within the chamber cannot be maintained constant against ambient changes
Solution Approach 1:
A pressure sensor is installed in the processing space to detect actual pressure conditions. The pressure control device uses this feedback information to adjust and maintain constant pressure within the processing space, compensating for ambient atmospheric changes through closed-loop control.
3Reliability
If the chamber pressure is controlled to maintain constant conditions, then processing stability is improved, but the apparatus cannot adapt to varying location environments
Solution Approach 1:
By segmenting the chamber into controlled and uncontrolled regions, the processing space can maintain constant pressure for stability while the overall apparatus can be placed in various environmental conditions without requiring the entire chamber to be controlled.
4Productivity
If a partition member is introduced to divide the chamber, then pressure control efficiency is improved, but device complexity increases
Solution Approach 1:
A partition member divides the chamber into distinct processing and non-processing spaces, enabling focused pressure control in the processing area. This segmentation improves pressure control efficiency by limiting the controlled volume while adding only moderate structural complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables precise and efficient pressure control within the processing space, independent of environmental location, while preventing chemical solution deterioration and reducing the apparatus's footprint.
Implementation Method 1
a gas supplying part that supplies gas into the processing space
Implementation Method 2
a gas exhausting part that exhausts gas within the processing space
Implementation Method 3
the partition member partitions the interior of the chamber into the first processing room, and a second processing room where the substrate is subjected to a demonized water process
Data Source
AI summary
A substrate processing apparatus performs a chemical solution process in a chemical solution process room that is partially formed within a chamber. During the chemical solution process, the substrate processing apparatus seals the chemical solution process room, and measures the pressure within the chemical solution process room, and controls the pressure within the chemical solution process room, based on a measured value. Irrespective of location environment of the substrate processing apparatus, the chemical solution process room can be controlled to a predetermined pressure. The substrate processing apparatus also permits efficient pressure control with respect to a minimum required amount of region.