Parylene Film CVD Apparatus Buffer Chamber Refill
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional chemical vapor deposition (CVD) apparatuses for forming parylene films face issues with throttle valve damage and high costs due to parylene gas deposition, and discontinuous fabrication when refilling powdered raw materials.
Innovation Solution
A CVD apparatus with a buffer chamber, evaporator, and pyrolysis chamber, equipped with valves to manage pressure and material flow, allowing continuous parylene film fabrication by refilling material without stopping the process or releasing vacuum.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If throttle valves are disposed between chambers to control pressure and flow, then pressure control and film thickness adjustment are improved, but throttle valves are damaged by parylene deposition requiring costly replacement
Solution Approach 1:
The system is divided into separate functional chambers (evaporator, pyrolysis chamber, deposition chamber) connected by pipes without throttle valves. Each chamber operates independently with its own pressure control, eliminating the vulnerable throttle valve components that were previously needed for inter-chamber flow control.
Solution Approach 2:
The patent introduces a novel intermediate structure where chambers are directly connected through pipes rather than using throttle valves as intermediaries. This direct connection with separate pressure control systems acts as a mediator that eliminates the need for throttle valves, preventing parylene deposition damage while maintaining flow control capability.
2Ease of manufacture
If throttle valves are removed to avoid damage, then valve replacement cost is reduced, but continuous fabrication cannot be performed when parylene material is consumed
Solution Approach 1:
The system enables continuous operation by allowing parylene material to be replenished in the evaporator chamber without interrupting the deposition process in the deposition chamber. The separate chamber design with independent pressure control allows material refilling while maintaining continuous film formation, eliminating downtime associated with traditional throttle valve-based systems.
3Reliability
If aqueous raw material is used instead of powdered material to prevent deposition on valves, then valve damage is avoided, but fabrication cost increases significantly
Solution Approach 1:
The patent extracts and removes the problematic throttle valve components from the system entirely. By eliminating the valves that caused deposition issues, the system can continue to use cost-effective powdered parylene material without suffering from valve damage, avoiding the need to switch to expensive aqueous raw materials.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables continuous fabrication of parylene films by preventing throttle valve damage and reducing costs through efficient material refilling, maintaining continuous operation and film quality.
Implementation Method 1
powdered parylene is placed in an evaporator and heated to 150° C. for evaporating powdered parylene
Implementation Method 2
Parylene gas is then passed to a pyrolysis chamber and heated to 650° C. for pyrolysis
Implementation Method 3
parylene monomer is delivered to a deposition chamber and deposited on a substrate
Data Source
AI summary
A method for forming a parylene film is provided, which includes following steps. Providing a chemical vapor deposition apparatus including a buffer chamber having first and second valves and a rotative carrying apparatus, an evaporator connected with the second valve, a pyrolysis chamber connected with the evaporator, and a deposition chamber connected with the pyrolysis chamber. Placing a parylene material in the rotative carrying apparatus of the buffer chamber through the first valve. Turning off the first and second valves and balancing a pressure in the buffer chamber and a pressure in the evaporator. Turning on the second valve and delivering the parylene material into the evaporator. Evaporating the parylene material in the evaporator to form a parylene gas. Pyrolyzing the parylene gas in the pyrolysis chamber to form a parylene monomer. Delivering the parylene monomer to the deposition chamber for deposition so as to form a parylene film.