Patch Similarity SNR Metric for Reliable Defect Annotation

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Solution Overview

Problem

Current methods for defect annotation, deep learning model tunability, and repeatability in semiconductor inspection are inadequate, leading to unreliable defect detection and classification, particularly for subtle defects and novel defects.

Innovation Solution

A patch similarity-based signal-to-noise ratio (SNR) metric is calculated to guide annotation, improve model tunability, and enhance repeatability by correlating with defect strength, using background noise statistics and GPU acceleration for computation.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If manual defect annotation is used, then annotation flexibility is maintained, but annotation reliability and consistency deteriorate

Engineering Contradiction:
Improveannotation reliabilityVSAvoidannotation process complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent introduces an SNR metric as an intermediary tool between the inspection system and annotators. This metric objectively quantifies defect strength and serves as a mediator that guides annotators in selecting appropriate defects for annotation, thereby improving reliability without significantly increasing process complexity

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The SNR metric provides feedback to annotators about the relative strength of detected defects, enabling them to make more informed decisions about which defects to annotate. This feedback mechanism improves annotation consistency and reliability while maintaining operational simplicity

Inventive Principle:
Principle #23Feedback

2Reliability

If deep learning models are trained with current methods, then model capability is achieved, but model robustness and repeatability deteriorate

Engineering Contradiction:
Improvemodel robustnessVSAvoidtraining efficiency
Core Design Contradiction:
ReliabilityVSProductivity

Solution Approach 1:

The patent changes the parameter used for defect selection from subjective visual assessment to objective SNR metric values. By using SNR as the selection criterion, the patent improves model robustness and repeatability while maintaining training efficiency through automated, objective defect selection

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent replaces the mechanical/subjective process of manual defect selection with an automated computational approach using SNR metrics. This substitution improves model robustness by eliminating human subjectivity while maintaining or improving training efficiency through automation

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

3Measurement precision

If inspection sensitivity is increased to detect subtle defects, then defect detection capability improves, but noise and false positives increase

Engineering Contradiction:
Improvedefect detection precisionVSAvoidfalse positive noise
Core Design Contradiction:
Measurement precisionVSObject-generated harmful factors

Solution Approach 1:

The patent uses SNR metric as a parameter that quantifies the relationship between defect signal strength and background noise. By selecting defects based on SNR threshold, the patent achieves high detection precision for subtle defects while filtering out false positives through objective signal-to-noise evaluation

Inventive Principle:
Principle #35Parameter changes

Data Source

PatentUS20260065666A1Signal-to-noise metric for annotation guidance, DL model tunability, and robustness
Publication Date: 2026.03.05 KLA CORP
  • US20260065666A1 patent drawing
  • US20260065666A1 patent drawing
  • US20260065666A1 patent drawing

AI summary

Methods and systems for determining a signal-to-noise metric for locations of interest on a specimen are provided. One or more statistics of non-defect signals from background patch images in a test image that are similar to a patch image of a location of interest in the test image are determined. The background patch images are found by searching a reference image for patch images that are similar to the location of interest patch image and finding the corresponding patch images in the test image. The signal of the location of interest in the test image and the one or more statistics are used to determine a signal-to-noise metric for the location of interest. The signal-to-noise metric can be used in applications such as defect annotation, deep learning (DL) model tunability, DL model repeatability, and novel defect detection.