Pattern Area Measurement Using Segmented Partial Patterns
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Solution Overview
Problem
Existing methods for measuring pattern dimensions, particularly the area of contact holes, suffer from inaccuracies due to noise in luminance information and variability in pixel selection, leading to poor reproducibility and accuracy.
Innovation Solution
A pattern dimension measuring apparatus and method that divides the pattern into partial patterns, calculates their areas, and sums them up, using line and differential profiles to detect edge positions and reduce noise by averaging luminance data from multiple pixels, thereby improving measurement accuracy and reproducibility.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If area is calculated by counting pixels extracted from pixel-based luminance information using a predetermined luminance threshold, then calculation is simple, but measurement accuracy and reproducibility deteriorate due to noise components and variability in pixel selection
Solution Approach 1:
The invention segments the pattern into multiple partial patterns and calculates the area of each partial pattern separately by counting pixels. The total area is then obtained by summing the areas of all partial patterns. This segmentation approach reduces the impact of noise and variability in pixel selection for any single pattern, thereby improving measurement accuracy and reproducibility while maintaining computational simplicity
Solution Approach 2:
Instead of calculating the area of the entire pattern at once, the invention performs partial calculations by dividing the pattern into multiple smaller partial patterns. This partial action allows for more precise local measurements that are less susceptible to noise, and the results are combined to obtain the total area with improved accuracy
2Measurement precision
If luminance information from multiple pixels is averaged to reduce noise, then measurement accuracy improves, but processing time and computational complexity increase
Solution Approach 1:
The invention segments the pattern into multiple partial patterns and processes each separately. By averaging luminance information within each small partial pattern rather than across the entire large pattern, the computational burden is reduced while still achieving noise reduction. This segmented approach balances accuracy improvement with acceptable processing time
Solution Approach 2:
The invention performs luminance averaging partially within each small partial pattern rather than globally across the entire pattern. This partial averaging action reduces noise effectively within local regions while minimizing the total computational workload and processing time required
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables accurate and reproducible measurement of pattern areas by reducing noise and variability, enhancing the precision of line width and area calculations in scanning electron microscopy.
Implementation Method 1
irradiate an electron beam onto a sample in a scanning manner; acquiring image data of a pattern according to the quantity of electrons emitted, by irradiation of the electron beam, from a surface of the sample
Data Source
AI summary
A pattern area measuring method includes the steps of: acquiring image data of a pattern; dividing the pattern into partial patterns; calculating the areas of the partial patterns; and calculating the area of the pattern by summing up the areas of the partial patterns. The step of dividing the pattern into partial patterns may further include the steps of: dividing the pattern into fan-shaped partial patterns each having a central angle of a predetermined value; calculating the line profile on a line intersecting the center of the pattern and an edge of the pattern for each of the partial patterns; creating a differential profile; and detecting an edge position of the partial pattern by use of the line profile and the differential profile and then deriving a radius from the center position and the edge position.