Pattern-Forming Method Using Block Copolymer Phase Separation
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Solution Overview
Problem
Current pattern-forming methods for electronic devices, such as semiconductor and liquid crystal devices, face challenges in forming finer patterns with reduced placement errors and bottom residues, especially when the pattern size is small, due to limitations in phase separation techniques.
Innovation Solution
A pattern-forming method involving the application of a first composition with a first polymer and solvent to a substrate, followed by a second composition with a block copolymer having a higher polarity structural unit, which separates into phases and allows for the removal of at least one phase, ensuring precise pattern formation with inhibited placement errors and reduced residues.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Length of moving object
If a block copolymer composition is applied to form finer patterns through phase separation, then the pattern size is reduced, but placement errors and bottom residues increase
Solution Approach 1:
The patent introduces a coating film as an intermediary layer between the substrate and the block copolymer composition. This coating film mediates the interaction between the composition and substrate, controlling the phase separation behavior to reduce placement errors and bottom residues while enabling finer pattern formation. The coating film acts as a buffer that modifies the substrate's surface properties to achieve better pattern fidelity.
2Length of moving object
If a block copolymer composition is applied to form finer patterns through phase separation, then the pattern size is reduced, but bottom residues increase
Solution Approach 1:
The coating film serves as an intermediary that prevents direct adverse interaction between the block copolymer composition and the substrate during phase separation. This intermediary layer controls the demixing behavior, reducing the formation of bottom residues while enabling the formation of finer patterns. The coating film modifies the interfacial energy to suppress unwanted residue formation.
3Stability of the object's composition
If the polarity of structural units in block copolymer is increased, then phase separation is enhanced, but interaction with coating film becomes more complex
Solution Approach 1:
The patent systematically adjusts the polarity parameters of the structural units in the block copolymer to optimize phase separation. By carefully selecting structural units with appropriate polarity differences, the patent enhances phase separation while managing the interaction complexity with the coating film. This involves balancing the polarity to achieve sufficient phase separation without creating overly complex interfacial interactions.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method effectively forms precise patterns with reduced placement errors and bottom residues, even at small sizes, suitable for the miniaturization demands of semiconductor and liquid crystal devices by optimizing phase separation and interaction between the coating film and resin layer.
Implementation Method 1
allowing the resin layer to separate into a plurality of phases
Implementation Method 2
The second polymer includes a first block including a first structural unit and a second block including a second structural unit. A polarity of the second structural unit is higher than a polarity of the first structural unit.
Implementation Method 3
Immediately before forming of the resin layer, a static contact angle θ (°) of water on the sidewall of the pattern satisfies an inequality (1)
Data Source
AI summary
A pattern-forming method includes: forming a pattern on an upper face side of a substrate; applying a first composition to a sidewall of the pattern; forming a resin layer by applying a second composition to an inner face side of the sidewall of the pattern coated with the first composition; allowing the resin layer to separate into a plurality of phases; and removing at least one of the plurality of phases. The first composition contains a first polymer. The second composition contains a second polymer. The second polymer includes a first block having a first structural unit and a second block having a second structural unit. The polarity of the second structural unit is higher than the polarity of the first structural unit. Immediately before forming of the resin layer, a static contact angle θ (°) of water on the sidewall of the pattern satisfies inequality (1).α≥θ≥α+β2(1)