Pattern Ground Shield for Spiral Inductor Q-Factor

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Solution Overview

Problem

As integrated circuit density increases, noise affects inductors, requiring effective shielding to improve the Q-factor, which is complicated by the need for unidirectional metal and mask coloring in advanced transistor technologies like 7nm gate widths, making traditional pattern ground shield implementation challenging.

Innovation Solution

The implementation of a pattern ground shield in the M0 layer with unidirectional metal traces and a current return path using higher level metals, coupled to a P+ diffusion, reduces parasitic capacitance and enhances the Q-factor of spiral inductors by blocking E-field penetration and preventing conduction current flow, while maintaining noise pickup and shielding functionality.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a traditional pattern ground shield is implemented to shield the inductor from noise, then the Q-factor of the inductor is improved, but the implementation becomes complex due to unidirectional metal and mask coloring requirements in advanced transistor technologies

Engineering Contradiction:
ImproveQ-factor of inductorVSAvoidimplementation complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The pattern ground shield is segmented into multiple discrete ground connections arranged in a specific pattern beneath the inductor. Instead of using a continuous ground plane, the shield is divided into separate ground pads connected through the substrate, which reduces the complexity of metal routing while maintaining effective noise shielding and preserving the inductor's Q-factor.

Inventive Principle:
Principle #1Segmentation

2Productivity

If the integrated circuit density is increased to improve productivity, then more circuits can be integrated, but noise affects certain circuits including inductors requiring additional shielding

Engineering Contradiction:
Improveintegrated circuit densityVSAvoidnoise affecting inductor
Core Design Contradiction:
ProductivityVSObject-affected harmful factors

Solution Approach 1:

The substrate itself is utilized as an intermediary medium to provide ground connections for the pattern ground shield. By leveraging the substrate's inherent grounding properties and creating controlled ground paths through it, the solution provides effective noise shielding for high-density circuits without requiring additional complex shielding structures that would reduce circuit density.

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach improves the Q-factor and self-resonance frequency of spiral inductors, enabling high-speed communication and supporting 7nm and sub-7nm transistor technology, with a higher self-resonance frequency and wider frequency range, critical for advanced communication systems.

Implementation Method 1

block the spiral inductor's E-field from penetrating into the electrically lossy substrate

Methodology Applied
Scientific EffectElectric Field: Electric Field

Implementation Method 2

enables shielding and picking up the substrate noise

Methodology Applied
Scientific EffectElectromagnetic coupling: Electromagnetic Induction

Data Source

PatentEP3566247B1Circuits for and methods of implementing an inductor and a pattern ground shield in an integrated circuit
Publication Date: 2021.04.21 XILINX INC
  • EP3566247B1 patent drawingFigure 1~2
  • EP3566247B1 patent drawingFigure 3
  • EP3566247B1 patent drawingFigure 4

AI summary

An integrated circuit device is described. The integrated circuit device comprises a substrate (202); a plurality of metal routing interconnect layers (710, 712, 716); an inductor (108) formed in at least one metal layer of the plurality of metal routing interconnect layers; and a bottom metal layer (702) between the plurality of metal routing interconnect layers and the substrate; wherein a pattern ground shield (302) is formed in the bottom metal layer. A method of implementing an inductor in an integrated circuit device is also disclosed.